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Die-Hard SRAM Design Using Per-Column Timing Tracking

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Presentation on theme: "Die-Hard SRAM Design Using Per-Column Timing Tracking"— Presentation transcript:

1 Die-Hard SRAM Design Using Per-Column Timing Tracking
Shi-Yu Huang and Ya-Chun Lai Feb. 10, Las Vegas (IC-DFN) Design Technology Center (DTC) National Tsing-Hua University, HsinChu, Taiwan

2 Timing Tracking Scheme
Outline Introduction Timing Tracking Scheme Traditional Replica-Based Scheme Our Scheme Experimental Results Conclusion

3 Nanometer Effects on SRAMs
Worse Device Mismatch Larger Leakage Current Could trigger a yield crisis! Wider Variations of R and C Lower VDD (smaller noise margins) Worse Supply & Coupling Noise Uncertain Delay

4 SRAM Memory Architecture
CS bit line WE OE A9 word line A8 Row Decoder . A0 Sense Amplifier / Drivers A19 Column Decoder A10 Input-Output (M bits)

5 Reading An SRAM Cell An SRAM Cell 1 cell current pulsed wordline
Q’ Q 1 cell current An SRAM Cell BL BL BL Bitlines’ Waveforms

6 Two Types of Sense Amplifiers
A Sense Amplifier Continuous Type Latch Type Sense Enable

7 Three Major Problems for SRAM
Mismatch in Bit Cells and Sense Amplifiers Vt mismatch shrinks the noise margin Bitline Leakage Current Could cause failure for READ operations Timing Tracking When to turn on sense amplifiers? When to turn off wordline? (pulsed wordline)

8 X-Calibration for Leakage Tolerance (Presented in Last IC-DFN)
Leakage is calibrated in two steps: Transform the effects of the bitline leakage to a Voffset between (BL, BL) Leakage Current 1 1 cell cell cell cell cell cell BL cell BL Deduct Voffset from the input of the sense amplifier When performing sense amplification cell 1.8V 1.5V X-calibration circuit S.A.

9 Die Photo of Test Chip X-Calibration BIST 1.373mm Conventional 1.108mm
SRAM Type Conventional Our X-Calibration Array Organization 1Kb cells (32 rows × 32 columns) Technology TSMC 0.18um CMOS 1P6M Area 486um × 265um (100%) 486um × 285um (107.6%) Access Time (1.8V) 1.89 ns 1.93 ns (102%) Supply Current (mA) 3.7 mA 4.15 mA (112%) 1.108mm 1.373mm BIST Conventional X-Calibration

10 Shmoo Plots Target speed: 150MHz @ 250C
Measurement result: Leakage tolerance improved by 317% Pass Fail Ileak=76.6uA Supply Voltage (V) Conventional Pass Ours with X-Calibration Supply Voltage (V) Fail Ileak=320uA Injected Leakage Current (uA)

11 Timing Tracking Scheme
Outline Introduction Timing Tracking Scheme Traditional Replica-Based Scheme Per-Column Timing Tracking Scheme Experimental Results Conclusion

12 Traditional Scheme – Replica Bitline
Property: replica bitline pair develops a logic signal (i.e., sense enable) when an accessed bitline pair builds up 100mV signal replica bitline pair decoder active wordline accessed logic sense amps CLK Ref: B. S. Amrutur et al., “A replica technique for wordline and sense control in low-power SRAMs,” IEEE Journal of Solid-State Circuits, Vol. 33, No. 8, pp , Aug

13 Problems of Replica Bitline Based Timing Control
The factors on the speed of a bitline pair: leakage, RC, driving of cell  Each column could have its own bitline development speed  A single sense enable control is susceptible to sensing errors Read cycle Read cycle Voltage (V) BL / BL SE

14 Adaptive Sensing Control
Each sense amp. adapts to its current driving bitline pair! Voltage (V) Read cycle BL / BL SE

15 Operating Flow Typical READ control steps Added timing tracking steps
Row address decoding Timing tracker start-up Wordline activation Timing tracker monitoring Bitline discharging ΔVBL>100mV? S.E. active ? N Y N Y Sense enable generation Sense amplification Timing tracker disabling

16 Controller, Input Buffer, Address Buffer
Overall Architecture Row Decoder WL Driver BL BL MC MC MC MC WL Cell Array MUX2 MUX2 det_en Timing Tracker Timing Tracker se SA SA Controller, Input Buffer, Address Buffer Latch& Buffer Latch& Buffer I/O Circuitry

17 Transient Waveforms for Read
Row Decoder WL Driver BL BL CLK MC MC BL / BL MUX2 WL det_en Timing Tracker se det_en SA Latch& Buffer se Desired property: SE goes high when bitline pair has 100mV!

18 Timing Tracking Scheme
Outline Introduction Timing Tracking Scheme Traditional replica-based scheme Per-Column Timing Tracking Experimental Results Conclusion

19 Effect of Variation on Sense Amp. Vt
As Vt mismatch in sense amplifier becomes excessive, the probability of read failure increases. proposal proposed Pass Rate replica-based dummy bitline Local standard deviation of Vt for transistors in SA (mV)

20 Effect of Variation on Bitline Capacitance
Our is insensitive to bitline capacitance variation. On the contrary, replica-based method is vulnerable. proposed Proposal 100fF Pass Rate 300fF 500fF replica-based dummy bitline Local standard deviation of Vt for transistors in SA (mV)

21 Layout of Test Chip Compared 1.208mm Capacitor Proposed 1.108mm
(Technology): TSMC 0.18um CMOS 1P6M (Creating Nanometer Effects): We used different loadings on different bitlines so as to mimic the different operating speeds in deeper nanometer technologies

22 Layout of Compared SRAM
Row decoder Cell array IO circuitry Column decoder & Output buffer Control & Input buffer & Row address buffer Column address buffer

23 Layout of Proposed SRAM
Row decoder Cell array IO circuitry & Timing tracker Column decoder & Output buffer Control & Input buffer & Row address buffer Column address buffer

24 Test Chip Characteristics
Technology TSMC 0.18um CMOS 1P6M Package 40-pin S/B SRAM macro organization 32 rows x 64 columns Test chip area 1.108 mm x mm Power supply voltage 1.8 V Operating Clock frequency 200 MHz Power dissipation for compared SRAM mW (100%) Power dissipation for proposed SRAM mW (136.8%) Access time for compared SRAM 1.969 ns Access time for proposed SRAM 2.301 ns (116.8%)

25 Conclusion Why Timing Control in an SRAM?
(1) for latch-based sense amplifier enabling (2) for pulsed wordline control So as to achieve lower power dissipation Drawback of Existing Replica-Based Scheme Replica simply cannot track every bitline pair Proposed Per-Column Timing Tracking Adaptive on-the-fly More tolerant to process variation Suitable for deeper nanometer technologies


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