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Femtosecond Laser Micromachining of BioMEMS BioMEMS Lab Mechanical and Aerospace Engineering University of Texas Arlington
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Comparison of Micromachining Processes ProcessResolution m Surface Roughness m Side Effects Mechanical1006.3-1.6Burring, requires polishing EDM1004.75-1.6Electrode wear, rough finish, slow and unclean process Chemical Etch2506.3-1.6Undercutting LIGA51-2Synchrotron source: very expensive Nd: YAG Laser501Redeposition Excimer Laser5 > 1 m (nm range) Recast Layer, aspect ratios Ti:sapphire Ultrafast Laser < 1nm rangeHigher power ranges may require vacuum environment
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Laser Micromachining Process
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Advantages of Laser Micromachining Non-contact machining Very high resolution, repeatability and aspect ratios Localized heating, minimal redeposition No pre/post processing of material Wide range of materials: fragile, ultra-thin and highly reflective surfaces Process can be fully automated
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Effect of Laser Micromachining Process Parameters Process ParametersEffect Wavelength, Focal length of lens Feature size Beam shape (Gaussian/square wave) Feature shape Beam energy, Pulse width Size of heat affected zone Depth of focusAspect ratio Vacuum or inert gas environment Amount of redeposition, size of recast layer
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Characteristics of Femtosecond Laser Micromachining Very high peak powers in the range 10 13 W/cm 2 provide for minimal thermal damage to surroundings Very clean cuts with high aspect ratios Sub-micron feature resolution Minimal redeposition Possible to machine transparent materials like glass, sapphire etc
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Ultrashort Pulses vs. Long Pulse Micromachining Ti: sapphire,120fs a) air b) vacuum c) Nd:YAG, 100ns Courtesy: Sandia National Labs Extremely short pulses provide for minimal thermal damage to surroundings
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Femtosecond Laser System at BioMEMS Lab Spectra Physics Hurricane Femtosecond Ti: sapphire Laser Pulse width: 106fs Wavelength range: 750nm-850nm Average energy: 1mJ/pulse Beam profile: Gaussian Polarization: linear, horizontal
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Femtosecond Laser Micromachining (Preliminary Experimental Testbed)
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Additional Equipment for Femtosecond Laser Micromachining Ultra-high precision 3-axis linear stage assembly by Aerotech Inc. Ultrafast High Energy Beam Attenuator by Newport Corporation. Power Meter by Scientech Inc. 2GHz Oscilloscope by Hewlett Packard Under development 10 -3 Torr, 1m 3 Vacuum Chamber with inert gas and electrical and power ports Fully automated multiple lens changer LabView based control environment
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Preliminary Experimental Results (a)Array of shots (b) Thru-hole drilled after 33 shots at a pulse energy of 14μJ Micromachining in 18μm Thick Aluminum Foil
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Single Shots in 18μm Thick Aluminum Foil Focal position Off-focal position Preliminary Experimental Results
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Thru-holes Drilled in 25μm Thick Brass Foil 56μJ/pulse 27μJ/pulse Preliminary Experimental Results
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Ablation Rate vs. Energy Density in 18 m Thick Aluminum Foil
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Optimization of Pulse Energy Required to Drill Thru-Holes
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Femtosecond Laser Bonding of Optically Transparent Materials Explore femtosecond laser bonding of optically transparent PMMA or glass to a substrate Automatic lens changer will be used to study the effect of variable focal length on the bond strength
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Laser Intensity Distribution in PMMA Focal length of 9mm Focal length of 40mm
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Through the Thickness Intensity Distribution of Transmitted Laser Beam in PMMA Focal length of 9mm Focal length of 40mm
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Automation of Laser Micromachining Process
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Conceptual Solid Model of Laser Micromachining Setup
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