1. 28-01-2014 Cleanroom committee neeting Jan 2014 Vijayaraghavan

2. PECVD DRIE Anelva Sputter 28-01-2014 Cleanroom committee neeting Jan 2014 Vijayaraghavan

3. Dry Etch– Tool status Update Jan 2014 RIE – SiGe etch process trials using CF 4,C 4 F 8 and Cl CF 4 gives vertical profile, high etch rate Selectivity checks to be done – Quartz etch Process trials with varying power using Ar,CHF 3 Etch rate increases with increase in power Work in progress for better profile SiGe etch Quartz etch 28-01-2014 Cleanroom committee neeting Jan 2014 Vijayaraghavan

4. PECVD – SiGe deposition – repeatability checks (for deposition rates and characterization) – Ge deposition – process trials to achieve low deposition rate – Annealing – as deposited samples amorphous, annealing for poly nature – vacuum leak in load lock - (bellow puncture in VAT valve), procurement still in progress. Process is done in manual mode due to load lock issue DRIE – AFM Tips work in progress 28-01-2014 Cleanroom committee neeting Jan 2014 Vijayaraghavan