1. TEA Systems Corp. Confidential LithoWorks PEB On-Wafer analysis of two wafers August 8, 2003 Thermal analysis of two PEB plates: 093-08_peb_bake7.csv 093-08_peb_bake8.csv

2. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -2- PEB #7

3. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -3- PEB #7 overview Left graphic ?Details location of sensor points Right graphic ?Summary of rise/fall times vs temperature

4. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -4- Sensor variation from wafer mean Each site contains a plot of delta-temp versus time Area ?product of (degrees * seconds), summed over all sites. This is proportional to the energy entered into the wafer during the bake. Area Variance ?Energy variation across the wafer ?Summed deg-secs over all sites reporting total variation from mean- temperature over time.

5. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -5- Corresponding points on the graph Moving the mouse to a point on the temp-time curve will highlight the corresponding points on the delta-temp wafer plot (50.1 sec, 113 C)

6. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -6- On-Wafer thermal loading? Notice how the 7 wafer-center sites are the first to rise in temperature. Note also the two sites located over the On-Wafer sensor packed lag in heading and also lag in cooling. This area also does not reach uniformity until the end of the heading cycle. ?This is most probably due to the thermal-mass loading of the sensor packet. The red-dot on each plot marks the same relative point on each site. Area of sensor packet

7. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -7- PEB 7; Thermal Energy Delivered Plot of thermal area (deg- sec) across wafer. Notice that there is a range of 168,714 deg-sec with the upper left of the wafer receiving the most energy Thermal-package sensor area is relatively cool No activation threshold was set for this plot thermal sensor area

8. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -8- PEB 7; Thermal Energy Delivered Plot of area (deg-sec) integrated over time Notice that there is a range of 168,174 deg-sec with the upper left of the wafer receiving the most energy

9. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -9- PEB 7: Thermal Energy Variance across wafer Variation in energy (integrated temperature*time) delivered Variation is greatest at wafers upper left corner, least in center & right.

10. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -10- Thermal Energy Variance Across Wafer - Contour

11. TEA Systems Corp. Confidential PEB 8 Data

12. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -12- Plate PEB 8, Bake Curve Top: PEB 8 Bottom: PEB 7 Curves appear very similar in shape.

13. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -13- PEB 8; Delta-Temperature Response (50.1 sec, 113 C) Same point is marked on the time- temp curve. ?Distribution in upper left of wafer is now very uniform.

14. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -14- Comparison PEB 8 vs PEB 7 Time-Temp Area Differences PEB 8 ?has a higher energy area. ?Exhibits greater excursion range and variation across the plate. PEB 8PEB 7

15. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -15- Comparison: Delta temperature with time PEB 8 exhibits more variation at the bottom of the wafer. PEB 8PEB 7

16. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -16- PEB 8; Thermal energy delivered

17. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -17- Thermal Energy Delivered – Bake 8 Contour

18. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -18- Comparison: Thermal Energy Delivered – PEB 8/ PEB 7 Both wafers as plotted on the same scale. More thermal energy delivered to PEB 7 PEB 8PEB 7

19. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -19- Thermal Energy Variation – Bake 8 Contour Energy delivered as a delta from the wafer average temperature. Energy = Sum((Temperature-Activation Temp.) * DeltaTime) ?DeltaTime = time interval of sample

20. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -20- PEB 8: Greatest variation in thermal energy

21. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -21- Comparison: Thermal Energy Variation – PEB 8/ PEB 7 Scales vary but characteristic is same PEB 7 has has significantly better energy uniformity PEB 8PEB 7

22. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -22- Comparison energy variation statistics PEB 8 exhibits ?A greater mean temperature, range and variance of temperature than PEB 7 PEB 8PEB 7

23. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -23- PEB 8/ PEB 7; thermal variation PEB 8 and 7 variations plotted to the same scale. PEB 8PEB 7

24. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -24- Thermal range study Bake8 Temperature range about the average temperature of the wafer at each time- slice. The cycled-temperature rose a total of 98.07 degrees. Steady state uniformity is 0.18 degree across wafer. Notice that the wafer at 121 degrees (max. temp at 134 sec.) did not reach steady-state uniformity.

25. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -25- Thermal range study Bake7 Same study with PEB 7 This study shows a red square at each transition start/stop point on the curve.

26. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -26- Range Uniformity Summary Plots exhibit the thermal range across the wafer at each time-slice Both plates exhibit the same steady-state thermal resolution. ?Thermal range and maximum temperatures differs by approximately one degree Neither plate reaches steady state while at the maximum temperature. Bake 8 has ?greater across-wafer variations (9.6 v 7.0 degrees) ?Greater range at the final temperature (0.9 v 0.6 degree) ?Smoother cooling curves than 7 ?Near identical rise/cool thermal slopes and time at the maximum temperature compared with Bake 7 Conclusion: Bake 8 has more thermal variation across the wafer. Bake 8Bake 7 Bake 8

27. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -27- Thermal Uniformity at any point in time Generate single or matrix graphics of all of the plots. A movie video will also be added to allow you to watch wafer heating.

28. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -28- Thermal changes during the up-ramp

29. TEA Systems Corp. Confidential Feature Analysis from older data sets. These data sets are not necessarily tied in with the peb 7&8 This is an attempt to see if there is any obvious correlation in the hopes that they may have been processed on one of the plates.

30. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -30- New Hotplate Top-CD

31. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -31- New hotplate, PR2 variation

32. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -32- BCD Response

33. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -33- TCD Old

34. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -34- Old Plate, TCD residuals to wafer

35. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -35- Old Plate; TCD - IFD and Mean

36. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -36- Old, PR2 Wafer

37. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -37- Old PR2 Wafer Resids

38. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -38- PR2 IFD and Mean for each field (wafer removed)

39. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -39- SWA – PR1 Old Wafer

40. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -40- SWA1 Old PEB - Wafer

41. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -41- PR2 – SWA Wafer model

42. TEA Systems Corp. Confidential August 2003LithoWorks PEB - Two plate studyPage -42- PR2 – SWA Wafer Resids