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EE 5340 Semiconductor Device Theory Lecture 08 – Spring 2011

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Presentation on theme: "EE 5340 Semiconductor Device Theory Lecture 08 – Spring 2011"— Presentation transcript:

1 EE 5340 Semiconductor Device Theory Lecture 08 – Spring 2011
Professor Ronald L. Carter

2 Second Assignment Submit a signed copy of the document posted at
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3 Test 1 – Tuesday 22Feb11 11 AM Room 129 ERB
Covering Lectures 1 through 9 Open book - 1 legal text or ref., only. You may write notes in your book. Calculator allowed A cover sheet will be included with full instructions. For examples see ©rlc L08-15Feb2011

4 Diffused or Implanted IC Resistor (Fig 2.451)
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5 An IC Resistor with L = 8W (M&K)1
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6 Typical IC doping profile (M&K Fig. 2.441)
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7 Mobilities** ©rlc L08-15Feb2011

8 IC Resistor Conductance
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9 An IC Resistor with Ns = 8, R = 8Rs (M&K)1
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10 The effect of lateral diffusion (M&K1)
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11 A serpentine pattern IC Resistor (M&K1)
R = NSRS NCRS note: RC = 0.65RS ©rlc L08-15Feb2011

12 Fermi Energy The equilibrium carrier concentration ahd the Fermi energy are related as The potential f = (Ef-Efi)/q If not in equilibrium, a quasi-Fermi level (imref) is used ©rlc L08-15Feb2011

13 Electron quasi-Fermi Energy (n = no + n)
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14 Hole quasi-Fermi Energy (p = po + p)
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15 Ex-field when Ef - Efi not constant
Since f = (Ef - Efi)/q = Vt ln(no/ni) When Ef - Efi = is position dependent, Ex = -df/dx = -[d(Ef-Efi)/dx] = - Vt d[ln(no/ni)]/dx If non-equilibrium fn = (Efn-Efi)/q = Vt ln(n/ni), etc Exn = -[dfn/dx] = -Vt d[ln(n/ni)]/dx ©rlc L08-15Feb2011

16 Si and Al and model (approx. to scale)
metal n-type s/c p-type s/c Eo Eo Eo qcsi~ 4.05 eV qcsi~ 4.05 eV qfm,Al ~ 4.1 eV qfs,n qfs,p Ec Ec EFm EFn EFi EFi EFp Ev Ev ©rlc L08-15Feb2011

17 Making contact be- tween metal & s/c
Equate the EF in the metal and s/c materials far from the junction Eo(the free level), must be continuous across the jctn. N.B.: qc = 4.05 eV (Si), and qf = qc + Ec - EF Eo qc (electron affinity) qf (work function) Ec EF EFi qfF Ev ©rlc L08-15Feb2011

18 Equilibrium Boundary Conditions w/ contact
No discontinuity in the free level, Eo at the metal/semiconductor interface. EF,metal = EF,semiconductor to bring the electron populations in the metal and semiconductor to thermal equilibrium. Eo - EC = qcsemiconductor in all of the s/c. Eo - EF,metal = qfmetal throughout metal. ©rlc L08-15Feb2011

19 Ideal metal to n-type barrier diode (fm>fs,Va=0)
n-type s/c No disc in Eo Ex=0 in metal ==> Eoflat fBn=fm- cs = elec mtl to s/c barr fi=fBn-fn= fm-fs elect s/c to mtl barr Eo qfm qcs qfi qfBn qfs,n Ec EFm EFn EFi Depl reg Ev qf’n ©rlc L08-15Feb2011

20 Metal to n-type non-rect cont (fm<fs)
n-type s/c No disc in Eo Ex=0 in metal ==> Eo flat fB,n=fm - cs = elec mtl to s/c barr fi= fBn-fn< 0 Accumulation region Eo qcs qfm qfs,n qfi qfB,n Ec EFm EFn EFi Ev qfn Acc reg ©rlc L08-15Feb2011

21 Ideal metal to p-type barrier diode (fm<fs)
EFp Eo Ec Ev EFi qfs,p qcs p-type s/c qfm EFm metal qfBn qfi qfp<0 Depl reg qfBp No disc in Eo Ex=0 in metal ==> Eoflat fBn= fm- cs = elec mtl to s/c barr. fBp= fm- (cs + Eg)= hole m to s barr. fi = fm-fs,p = hole s/c to mtl barr. ©rlc L08-15Feb2011

22 Metal to p-type non-rect cont (fm>fs)
EFi Eo Ec Ev EfP qfs,n qcs n-type s/c qfm EFm metal qfBn q(fi) qfp Accum reg qfBp qfi No disc in Eo Ex=0 in metal ==> Eo flat fB,n = fm - cs = elec mtl to s/c barr fBp= fm- (cs + Eg) = hole m to s fi = fm-fs,n = s/c to mtl barr. ©rlc L08-15Feb2011

23 Metal/semiconductor system types
n-type semiconductor Schottky diode - blocking for fm > fs contact - conducting for fm < fs p-type semiconductor contact - conducting for fm > fs Schottky diode - blocking for fm < fs ©rlc L08-15Feb2011

24 References 1 and M&KDevice Electronics for Integrated Circuits, 2 ed., by Muller and Kamins, Wiley, New York, See Semiconductor Device Fundamentals, by Pierret, Addison-Wesley, 1996, for another treatment of the m model. 2Physics of Semiconductor Devices, by S. M. Sze, Wiley, New York, 1981. 3 and **Semiconductor Physics & Devices, 2nd ed., by Neamen, Irwin, Chicago, 1997. Fundamentals of Semiconductor Theory and Device Physics, by Shyh Wang, Prentice Hall, 1989. ©rlc L08-15Feb2011


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