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Application of Inline Defect Part Average Testing (I-PAT™) to Identify Potential Latent Reliability Defect Escapes: Feasibility Study Results at NXP Contributing.

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Presentation on theme: "Application of Inline Defect Part Average Testing (I-PAT™) to Identify Potential Latent Reliability Defect Escapes: Feasibility Study Results at NXP Contributing."— Presentation transcript:

1 Application of Inline Defect Part Average Testing (I-PAT™) to Identify Potential Latent Reliability Defect Escapes: Feasibility Study Results at NXP Contributing Authors: Onder Anilturk, Joyce Witowski, Nikolas Sumikawa, Mommay Ng, et al, NXP Semiconductors N.V. John C. Robinson, Mike von den Hoff, David Price, Jay Rathert, et al, KLA Corporation Dan Sebban, Stas Shavlev, Randall Smith, William Usry, et al, Optimal Plus Corporation

2 Agenda Problem Statement & Proposed Solution NXP Feasibility Study
Conclusions

3 Company Overview Total Quality Vision
When our customers think of NXP, we want them to think Total Quality First time right development, designs and qualification Deliver zero defects to our customers Provide flawless customer support Total Quality is our foundation enabling a Smart, Safe and Secure World Total Quality Vision enabled by Quality Mindset & Culture

4 Company Overview Lifecycle analytics for reliable electronics
Accelerating Reliability for Automotive ICs Lifecycle analytics for reliable electronics Actionable analytics solutions for smart manufacturing Serving the leading brands in the automotive, semiconductor and electronics supply chains Worldwide leader in Quality and Reliability solutions for: Semiconductor Manufacturing Packaging PCB and Flat Panel

5 The Business Problem Increasing semiconductor content per vehicle
$600 Increasing semiconductor content per vehicle Higher expectations from customers Tightening requirements DPPM <.1 DPPM Source: Gartner DPPM – Defective Parts Per Million

6 The Technical Problem: Reliability Defects
Latent reliability defects (LRDs) which become activated after test Typically partial bridges / opens Statistically more prevalent in highly defective die Killer defects in test coverage gaps No Impact Defect Potential Early Life Failure Defect Look here first Likely Yield Failure Defect Fab reliability defects tend to fall into two categories. Both are basically the same The number one fab problem plaguing automotive electronics are a class of defects called “Latent Reliability Defects”. These are defects that become “activated” some time in the field by repeated use, stress, temperature, etc. In other words, they do not kill the die at test. They are latent. Some time after test they cause the failure. Auto suppliers try to reduce this by using various degrees of burn-in– but this is very expensive, impossible to fully simulate all the, and imparts its own reliability concerns) can not tease out all of these problems. In general, the defect types which lead to reliability failures are generally the same basic defect types that cause yield loss– they are distinguished primarily by size and where they land relative to the device structure. The simplest manifestation of random defectivity is a particle. A large particle could lands on a line and block a subsequent patterning operation leading to an electrical open.-- in which case the chip will not pass final test and it won’t find it’s way into a car. But this smaller particle may only partially block the line. It may very well pass final test, but after subsequent cycling in a harsh environment this partial open eventually becomes fully-open. We refer to these defects as latent reliability defects– latent because they are only activated at some time after final test. Similar mechanisms are at work for shorting defects. Statistically more prevalent in highly defective die Partial bridges Partial opens Other: resistive contacts…TBD

7 Challenge of Existing Methods
Reliability Defect Escapes Customer Field Activation and Failure E-Test Electrical wafer sort Burn-in Final Test Board Part Fab Fab: Sub-samples a small percentage of product to control the process and stop excursions Electrical Test: Go/No-Go decision ambiguity Latent defects aren’t easily detectable at test. Untestable areas  Coverage versus time-based costs.  PAT: Parametric outlier analysis helps tremendously, but escapes might still happen. Zero Defect: How to improve when you’re already doing each individual part extremely well?

8 Breaking Down Silos: Holistic View
Can we do more with the data we already have? Front-end (FAB) Process Limited data sharing between silos Defectivity & Metrology Electrical Wafer Sort Final Test + FAB TEST PCBs, Systems Back-end (Test) Process yield Time-to-Mkt Quality Reliability Soft Bin, Parametrics Soft Bin, Parametrics Most production analytics (outlier detection algorithms) use only electrical wafer sort data

9 Example: Merging Inline Defect Data with Electrical Wafer Sort (EWS) provides clues for potential reliability failures Which die are most likely to fail?

10 Inline Part Average Testing (I-PAT)
I-PAT is a method for die-level screening based on inline defect results which uses advanced correlation engines to weight defectivity, create a die-level defectivity score, and identify high reliability risk die using statistical outlier detection. Inspection Layer 1 Stacked map Inspection Layer 2 Inspection Layer 3 Inspection Layer 4 . Stack inspection data on reliability relevant layers Enhance defect data S/N I-PAT method screens high-risk die with outlier defectivity Sum of die’s weighted defects Attributes: Layer, Size, Location, etc. Statistical approach. Selectable limits Validate outlier correlation Inspection Layer 8 Is there a statistical difference in chip reliability between Chip A and B?

11 Optimal+ Outlier Detection Solution - Typical PAT Rule
The solution allows to screen potentially marginal parts by processing a sequence of PAT algorithms on test data The PAT rule can be defined (and optimized) either using supervised or unsupervised methodologies Simulations on historical data are usually performed before the PAT rule is deployed for use in volume production Typical PAT Rule Example

12 Agenda Problem Statement & Proposed Solution NXP Feasibility Study
Conclusions

13 NXP Feasibility Study Overview
Historic analysis: Defective die that would be screened out at inspection or subsequent tests are used in this study for correlation purposes Sample population represents 600 wafers (~250k die) 8 Inline defect inspections per wafer (4 FEOL, 4 BEOL) on high sensitivity broadband inspection system Electrical Wafer Sort, Final Test and Burn-In data used for correlation Stacked wafer map NVM stack etch 1 NVM stack etch 2 Post salicide Post contact barrier Post metal 1 CMP Post metal 2 CMP Post metal 3 CMP Post last metal CMP

14 Correlation of Inline Defect Outliers with EWS
Observation: I-PAT defect outlier die bins correlate with EWS fallout die Note: I-PAT results from blind training using defect attribute only: no EWS feedback used to identify I- PAT outlier die, independent validations. Implication: I-PAT outlier die that somehow pass EWS should be more closely analyzed (e.g., ink-off, burn-in testing, more e-test programs) Correlation of Defect-Based Die Outliers (I-PAT) with Electrical Wafer Sort (EWS) EWS Fallout Rate I-PAT Distribution High I-PAT Scoring Die are more likely to fail EWS due to defects Binning is used by O+ to improve the statistics. These are just example bins. There are many others. HB124 “HV erase” stress test targeting latent reliability, known to be correlated to BEOL contact to poly overlay, but for the first time it is demonstrated to correlate also to FEOL transistor defectivity – NXP extremely excited! I-PAT Die Bins Less defective die More defective die

15 Defectivity Index (I-PAT) correlation to EWS
I-PAT was correlated to both Wafer Sort and Final Test yield Drilldown to soft bin and parametric test level can easily be achieved for higher level of granularity in the correlation between defectivity and electrical test performance Correlation to EWS Yield Correlation to specific Soft Bin Fallout Correlation to Parametric Test performance Average Total die count EWS yield % bin I-PAT bin (ascending) I-PAT bin (ascending) I-PAT bin (ascending)

16 Defectivity Index (I-PAT) correlation to EWS
I-PAT can identify individual statistical outlier die, and drill down to root cause Better screening using both test and defectivity data, e.g. Applying I-PAT defect outlier recognition Using G-PAT to detect clusters using combination of test and I-PAT data Bin Map post standard Outlier Detection Bin Map post enhanced Outlier Detection Smart I-PAT Map Bin Map HB998  I-PAT Static PAT HB997  G-PAT outliers (test and defectivity) HB99  G-PAT (test only)

17 Case Study: BEOL Defects
Cu defect at backend of line (BEOL) metal layers is a potential source of reliability escapes I-PAT has the potential for early identification of Cu defects, closer to the root cause, and the opportunity to optimize test and enhance screening methodologies. Cross sectional representation of Cu void defect Top Down Cu Defect Examples on die which failed EWS & FT Fuse

18 Correlation of Inline Defect Outliers with Burn-In
Correlation of Defect-Based Results (I-PAT) with Post-Burn-in Electrical Test Observation: I-PAT defect outlier die bins correlate with Burn-in fallout die. Implication: I-PAT outlier die should be more closely analyzed (e.g., P-PAT, G-PAT, etc.). I-PAT plus additional manufacturing and test are needed to improve prediction  lower false positive (escapes) and lower false negative (unnecessary yield loss) Burn-in Fallout Rate High I-PAT Scoring Die are more likely to fail burn-in due to activated latent defects Burn-In Cumulative Failure Map Binning is used by O+ to improve the statistics. These are just example bins. There are many others. HB124 “HV erase” stress test targeting latent reliability, known to be correlated to BEOL contact to poly overlay, but for the first time it is demonstrated to correlate also to FEOL transistor defectivity – NXP extremely excited! I-PAT Die Bins Less defective die More defective die

19 Burn-In Prediction using Reliability Index (RI)
Burn-In was added in Manufacturing flow as an additional stress test The motivation is to reduce the cost of Burn-In without impacting Product Reliability Using Reliability Index, we can define the parts which are more likely to fail during Burn-In and adapt the burn-in testing accordingly per each unit. Current flow Defectivity / Metrology Test Burn-in Ship to customer Pass Pass Proposed flow Input data Response data Defectivity / Metrology Test ML model for RI Burn-in Ship to customer Pass Pass Pass Skip

20 I-PAT Model Prediction
“Ground Truth” Indicators for Reliability Failure: SEM Defect Images of known failure modes Electrical Wafer Sort Final Test Burn-in Field returns Hit-back analysis Defect Weighting Die-Level Reliability Metric Correlation Engine Die Aggregator Statistical Filter Inspection Defect Attributes # of Defects per die Defect type (rough bin) Defect size, shape, polarity, etc. Proximity to critical area In Die Region (e.g., test coverage gaps) Defect source analysis Modeled yield impact Spatial Signature Analysis Stacked layers & stacked die position

21 Burn-In failures Prediction – Machine Learning (ML) Flow
I-PAT Feature reduction (Big data Analytics) Supervised multivariate feature selection ML modeling Model validation EWS xxx features xxxx features xxx features xx features Model Engineering xxx features Thousands of features are used to build a Machine Learning model. The effectiveness of the model depends on the quality of the data and the domain knowledge Note that this is supervised Machine Learning, i.e. historical burn-in data performance is used to create and validate the model.

22 Engineering Features for ML Model
In addition to existing model input parameters (or features) domain expertise can be applied to increase the amount of features and improve the predictive capabilities of the model Parametric / Test Engineering Features Wafer and lot level statistics Multivariate parameters (such as principal components) Geographical data such as radius and wafer zones Defectivity Engineering Features I-PAT Model (FE, BE) Additional defectivity data (such as defect attributes, wafer zones, in-die regions) Z-axis I-PAT aggregation

23 Next Steps: Adaptive Burn-in*
ML model shows opportunity of reducing Burn-in by 20% with 0 impact to DPPM This allows to define the threshold for the Manufacturing Reliability-Index RI threshold Reliability index *non-NXP example illustration

24 Next steps: Drilldown to Important Features*
Despite the model not being fully ‘transparent’, it is possible to understand what the most important features are which predict the burn-in outcome In this example, the top 30 predictive features cover ~ 95% of overall predictive power of the ML model *non-NXP example illustration

25 Potential Implementation Use Cases
Use I-PAT data to enhance standard Outlier Detection (PAT) rule, that is today based solely on test data Build and implement ML model based on defectivity (I-PAT) and test data to predict burn-in failures Feedback information to continuously improve in-line defectivity inspection recipes, and outlier detection rules

26 Agenda Problem Statement & Proposed Solution NXP Feasibility study
Conclusions

27 Conclusions NXP is striving to raise the bar to identify and eliminate ppb (parts per billion) levels of failure and is continually looking for opportunities to drive quality and achieve zero defects. Participation in this feasibility study is one example of that commitment to quality. I-PAT has the potential to bring additional data to identify and screen out outlier die containing possible latent reliability defects. Combination of I-PAT, test data and advanced analytics can be used to identify potential latent reliability defects while reducing overkill and burn-in costs Continuous improvement (defects classification, I-PAT algorithm, ML model …) is needed to lower cost of screening, and improve product outgoing reliability performance Future studies include investigation into feasibility of a production implementation of I-PAT

28 Thank you


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