1. Arradiance ALD/Incom MCP Test
Incom substrate
40µm pores, 8 deg bias, 40:1 L/D
Sent to Arradiance for resistive and emissive layer application + electrode
Resistance approx 750 MΩ in vacuum
Arradiance tests show 50, v
Tested as a single MCP + Phosphor
High resolution images and scrubbing progress.

2. Arradiance ALD/Incom MCP Test
UV light
550v
Bright scratch on phosphor
1000v background, no obvious
hotspots other than phosphor defects

3. SSL-UCB, ALD/Incom MCP Test
Multifiber pattern fades as the MCP gain is increased
Gain is quite uniform

4. SSL-UCB, ALD/Incom MCP Test
We can see the 40µm pores
We can see the Hex boundary distortions are uneven
800v MCP
2900v screen

5. ALD/Borosilicate MCP Test
We can see the Hex boundary distortions cause gain nonuniformity
550v MCP
1000v MCP

6. Arradiance conduction and emission films
10 mm pore NO LEAD glass substrate, 40:1 L/D, Bias = 880V,
Iout~0.4 pA/pore, gain under electron bombardment
Tremsin - LAPD workshop
Arradiance, Inc.

7. UV Scrub 25mm 40µm 40:1 ALD MCP Quite stable after 0.03 C/cm2,
Starts at Bias = 700V, gain x1000, 0.6µA, change to 850v, 0.8µA at 0.03C/cm2
Quite stable after 0.03 C/cm2,
vs 0.2 C/cm2 for normal MCP
Note: no pre-vacuum bake