1. Laser and Application Laboratory, FORTH-IESL
Laser Microfabrication: etching and printing of metals, oxides and biomaterials
Dr. Ioanna Zergioti
Laser and Application Laboratory, FORTH-IESL
Co-workers
A. KARAISKOU (FORTH-IESL)
Dr. D. PAPAZOGLOU (FORTH-IESL) Dr. D. KAFETZOPOLOULOS (FORTH-IMBB)

2. Laser Micromachining Workstation
248 nm, 500 fs
Laser 248 nm, 500 fs

3. Nd:YAG laser 532, 1064 nm, 6.5ns)
fs excimer laser 500fs)

4. Etch Frustration of LiNbO3 by Laser
Latent frustration of chemical etching of the single crystal z-cut LiNbO3 induced by 500fs 248nm laser irradiation
Applications: waveguides, optical modulators
Appl. Phys. A, (2002)
In collaboration with Optoelectronics Research Center, Southampton, UK

5. Microetching of Multilayers Si/Mo
Gratings on the multilayers Si/Mo w~ 0.8 μm
Application: Bragg-Fresnel optics for soft X-Rays
to appear Applied Physics A, 2002
In collaboration with Slovak Academy of Sciences

6. Demonstration of the Proposed HOLAUTHENTIC Methodology (GROWTH project)
Design image
CG Hologram
Microetched CGH
(170x170 µm2)
Image reconstruction
Sensor on Black Marble, irradiated by Nd:YAG laser at 355nm
In collaboration with THALES RT, THALES-L, KING’S COLLEGE LONDON, TECHNICAL UNIV. DARMSTADT , BENAKI MUSEUM OF ATHENS, NATIONAL GALLERY OF ATHENS

7. DIFFRACTIVE GRATINGS InOx
Temporal evolution of relative change of the diffraction efficiency at various temperatures for activation UV intensity 1.9 W/cm2
Appl. Phys. Let., 78, 7, , (2001)

8. Lasers Print Biomaterials
SEM of deposited λ DNA (100 μm) A
λ Sty I C
SEM of deposited BSA (50 μm)
Fluorescence of c-myc GST
with anti-c-myc Cy3 (100 μm) C D B
Pulse 500 fs,
WL: 248 nm KrF,
Fluence 350 mJ/cm2
LM of deposited DNA