1. National Taiwan University
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Prof. M.-H. Liao (廖洺漢)
National Taiwan University
2017/1
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2. M.-H. Liao (廖洺漢) Education: Experience: Research:
Education:
Department of Mechanical Engineering, National Taiwan Uni.
B.S
Graduate Institute of Photonics and Opto-electronics, National Taiwan
Uni. PhD (Advisor: Prof. CheeWee Liu)
Experience:
RD/TD, TSMC, (A9 chip in Apple i-Phone 6s)
Assistant/Associate professor, Department of Mechanical Engineering,
National Taiwan Uni., 2011-Now
Publish 30+ technical papers in top conference proceedings and international journals such as IEDM and VLSI, mainly in the field of advanced transistor developments along with 10+ patents.
Demonstrate the high device performances of Ge (VLSI 2014)/III-V MOSFETs, steeper slope transistors with negative capacitance effect and low power consumption (IEDM 2015), vertical nano-wire/tube devices (JAP), and magnetic spin-electronics (VLSI 2014).
Research:
Semiconductor technology
MEMS
IoT
Micron-NTU Day

3. Magnetic Logic Device and Cell (VLSI 2014)
* VLSI 2014, By M.-H. Liao et.al.
How to create the high built-in Magnetic field in the Metal Gate ?
Different Sputter Chamber Design ? (With the External Magnetic Field ?)
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4. The enhancement of Melting point in Si/Ge
The Melting point on Si and Ge is very critical for the semiconductor process/device
(activation..). We are finding the way to extract it accurately and try to enhance it.
How to enhance the melting point in Si and Ge ?
Anneal with different pressure environment and different anneal/temperature
arise rate is a solution ?
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5. Atomic Layer Deposition/Etching System
Atomic Layer Deposition and Etching System is very important for the industry.
If it is possible to grow the crystal Si and Ge by ALD System ?
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6. Local thermometry of self-heated nano-scale devices (Temperature Extraction)
Tool Set-Up
Demo-
Principle
How to measure the temperature in the nm-level space resolution is very important for the application in the industry.
Build up the temperature measurement system with the AFM ?
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7. Acknowledgement
We appreciate the funding support from the government, industry, and university.
The useful discussion and in-put from the academic colleagues is also very appreciated.
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