Design options for emittance measurement systems for the CLIC RTML R Apsimon.

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Presentation transcript:

Design options for emittance measurement systems for the CLIC RTML R Apsimon

Proposed locations 1) Damping ring extraction line – Measure extraction emittance 2) Between central arc + vertical transfer in RTML – Measure emittance growth in BC1, booster linac and central arc 3) At end of RTML – Measure emittance at entrance of main linac

Proposed locations System 1 System 2 System 3

Emittance measurement Use laserwire scanners to measure beam size – Non-destructive measurement 4 measurement locations (both H and V) – To reconstruct beam matrix at a reference point

Laserwire scanner Laser fired perpendicular to electron beam – Produces Compton photon in electrons’ direction of motion. – Compton detector downstream measures photons Intensity proportional to electron beam intensity Scan laser position to measure electron intensity profile → calculate beam size – Chicane to separate photons and electrons 0.1m deflection needed to fit detector

Considered optics designs 4 FODO cells, 1 scanner per cell – 45 o (180 o /N) phase advance per cell (H and V) Optimised to minimise emittance measurement error 2 FODO cells, 2 scanners per cell at each quad – 90 o phase advance per cell Tracking simulations to compare schemes

Simulation outline 10 4 “particles” tracked through system – Measurement retaken 10 4 times with error – Fractional error at each scanner assumed equal – Calculate emittance for all 10 4 measurements – Use to calculate fractional error on emittance vs beam size measurement error – Same simulation procedure as described in: Yu. A. Kubyshin et al., “simulations of emittance measurement at CLIC”, PAC11 proceedings, pp

Design comparison Blue line: 90 o scheme Red line: 45 o scheme

Design comparison Blue line: 90 o scheme Red line: 45 o scheme

Comparison results 45 o scheme – Smaller error on emittance measurement – Smaller fraction of non-physical results – 2x 90 o FODO cells is ~50% longer than 4x 45 o cells 45 o scheme is clearly the design to adopt

System designs 1) Extraction line – No design yet, should be easier than RTML 2) Mid-RTML emittance measurement – Design described on next slides 3) Pre-linac emittance measurement – Design optimised and documented Yu. A. Kubyshin et al., “simulations of emittance measurement at CLIC”, PAC11 proceedings, pp

RTML optics 45 o FODO cells Emittance measurement system Very long system, large beam sizes, difficult to measure accurately with laserwire scanner (spot size ~5μm). Laserwire scanner can measure beam sizes between approx 1-10 times laser spot size; accuracy deteriorates outside this range. Need to reduce length and beam size → use matching cell

Improved measurement system Use matching cell – Squeeze β by factor of 4 Compromise between system length + quad strengths Quad strengths: k ~ m -2 ; acceptable? – Normal RTML FODO quad strength: k ~ 0.01m -2 To un-squeeze beam: – Use chicane to match β and correct dispersion Total system length ~ 1127m

Optics layouts for Mid-RTML system LW1 LW2LW3LW4 LW1 LW2LW3LW4 No matching cell (nominal optics) Matching cell (“squeezed” optics) Diagrams are not to scale -Matching cell quad -FODO cell quad -Chicane quad -Chicane dipole

Emittance growth Dipoles in chicane: – Use same radius of curvature as dipoles in turn around sections (305m). Quadrupoles: – Limit quad strengths to k ~ ±0.05m -2 These equations are taken from “RMS emittance growth due to intrinsic quadrupole aberrations”, R. Baartman

Emittance growth calculations Calculated emittance growth from each element in measurement system: – Quadrupoles: Total contributions: for both H and V planes – Negligible emittance growth Emittance growth from alignment errors will dominate – Still orders of magnitude less than dipole contributions! – Dipoles: – Neglect vertical emittance growth – Misalignments will significantly increase emittance growth

Horizontal beam profile Normal FODO cell 4 bump chicane Emittance measurement Matching cell NB: no deflection shown in 4-bump chicane

Vertical beam profile Normal FODO cell 4 bump chicane Emittance measurement Matching cell

Summary Pre-linac system (“system 3”) previously designed and optimised Mid-RTML system (“system 2”) design shown – Based on design of “system 3” Various optics designs examined to determine optimal performance.

Still to do… Design extraction line system (“system 1”) Further tracking simulations to examine system performance. Emittance growth from alignment errors – Define tolerances Define requirements for each laserwire system