10 Picosecond Timing Workshop 28 April 2006 1 PLANACON MCP-PMT for use in Ultra-High Speed Applications.

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10 Picosecond Timing Workshop 28 April PLANACON MCP-PMT for use in Ultra-High Speed Applications

10 Picosecond Timing Workshop 28 April Planacon™ MCP-PMTs Two inch square flat PMT with dual MCP multiplier. Anodes, 2x2, 8x8 and 32 x 32 configurations. Improved Open Area Ratio device now available Bi-alkali cathode on quartz faceplate. Easily tiled, low profile, excellent time resolution, excellent uniformity.

10 Picosecond Timing Workshop 28 April mm Square family of MCP based PMTs –8500X – 4 anode –8501X – 64 anode –8502X – 1024 anode New improved Active Area Variants available with 86% active area, 85002/85012/ anode PMT available with integrated Anger- logic readout Gated High Voltage Power Supply available PLANACON Family

10 Picosecond Timing Workshop 28 April MCP-PMT Operation Faceplate Photocathode Dual MCP Anode Gain ~ 10 6 Photoelectron  V ~ 200V  V ~ 2000V photon

10 Picosecond Timing Workshop 28 April MCP-PMT Construction Faceplate Anode & Pins Indium Seal Dual MCP MCP Retainer Ceramic Insulators Spacing between faceplate and MCP and MCP and anode can be varied for different applications Anode can be easily modified

10 Picosecond Timing Workshop 28 April Timing Limitations –Detected Quantum Efficiency (DQE) Photocathode QE Collection efficiency Secondary emission factor of first strike –Electron optics and amplification Cathode – MCP Gap and Voltage Pore-size, L:D, and voltage of MCP MCP-Anode Gap and Voltage –Signal extraction

10 Picosecond Timing Workshop 28 April Detected Quantum Efficiency DQE ComponentCurrentNext GenLimit 420nm20%28%32% Open Area of MCP50%70%80% First Strike85%90%95% DQE for Timing8.5%17.6%24.3% Multi-photon TTS improvement

10 Picosecond Timing Workshop 28 April DQE Efforts –Photocathode QE Developing new cathode recipe for transfer system based on nuclear medicine bi-alkali which has 35% QE –Collection efficiency 10 micron pore improves open area to ~60% Over-etching of glass can increase this to 70% Funneled pores can increase this to > 80% –Secondary yield Current yield is 2.3 – 3.0 Deposition of enhancement films such as MgO 2 can improve this to 5.0 or higher

10 Picosecond Timing Workshop 28 April Cathode-MCP Gap –Limitations Recoil electrons (cause long TT shoulder) –Decreased DQE for leading edge timing measurements –Decrease imaging capabilities Transit time (Variations in p.e. velocity) –Dominated by transverse momentum of the photoelectrons –Becomes worse at higher photon energies –Counter-measures Reduce physical gap –Significant reduction in transit time, reducing effects of transverse momentum Increase voltage –Higher acceleration reduces transit time and effects of transverse momentum

10 Picosecond Timing Workshop 28 April Recoil Electrons MCP Faceplate pe Recoil Electron Scattered electrons can travel a maximum of 2L from initial strike Produces a TTS shoulder Reduces the DQE for direct detection L

10 Picosecond Timing Workshop 28 April Drop Faceplate Cathode – MCP gap is decreased from to ~0.85mm Photocathode active area is reduced to 47mm from 50mm

10 Picosecond Timing Workshop 28 April Effect of Reduced PC-MCP Gap 11/30/ /5/2004, Playa del Carmen, Mexico 5th International workshop on Ring Imaging Cherenkov Counters (RICH 2004), Development of Photon Detectors for a Fast Focusing DIRC C. Field, T. Hadig, David W.G.S. Leith, G. Mazaheri, B. Ratcliff J. Schwiening, J. Uher,+ and J. Va’vra*

10 Picosecond Timing Workshop 28 April Cathode – MCP Transit Time Increased voltage or decreased gap can drastically reduce the transit time, and therefore transit time spread

10 Picosecond Timing Workshop 28 April MCP Contributions –MCP amplification is responsible for anode rise- time Secondary electron trajectories result in variations in time between strikes. –Pore-size Reduced pore size decreases thickness for the same amplification, reducing transit time L:D sets the gain assuming same applied field Want small pore size, minimum L:D and high field Bias angle increases transit time and amplification, can reduce L:D and increase bias to keep timing properties the same but improve lifetime

10 Picosecond Timing Workshop 28 April Amplification in Pore Typical secondary yield is 2 For 40:1 L:D there are typically 10 strikes (2 10 ~ 10 3 gain single plate) Number of strikes depends on velocity of individual secondary electrons

10 Picosecond Timing Workshop 28 April MCP Transit Time Transit time assumes 10 strike in 40:1 L:D with 1000V applied per plate, Chevron configuration, cold secondary electrons

10 Picosecond Timing Workshop 28 April Anode-MCP Gap –Limitations Transit time (Variations in secondary electron velocities) –Dominated by location of origination in MCP –Also affected by transverse momentum Capacitance and Inductance between the two electrodes –Can effect signal quality at the anode –Counter-measures Reduce physical gap –Significant reduction in transit time, reducing effects of transverse momentum Increase voltage –Higher acceleration reduces transit time and effects of transverse momentum Provide a ground plane or pattern on the anode Reduce resistance of MCP-Out electrode

10 Picosecond Timing Workshop 28 April Other Considerations Current limitations –Have received MCPs with 300uA strip current, achieve 30uA linear operation –Can increase to 60uA with electrode change Lifetime –Capital investment in better electron scrub system –Recent modifications to the process which increases lifetime, measurements in process –Increased bias angle up to 19 degrees –Gating of Cathode during periods of no data collection Anode configuration –Can modify electrode pattern on anodes to include ground plane or ground pattern for improved signal extraction

10 Picosecond Timing Workshop 28 April Future Directions Improved DQE Improved average anode current (50 – 100 uA) Improved lifetime Step faceplate to optimize timing Reduce anode-MCP gap to investigate effect on signal integrity and TTS MCP input treatment to optimize DQE and reduce recoiling effect (increased Open Area and high yield coating) New anode configurations with integral ground plane or ground pattern to improve