SEMINAR 1. Title :Introduction of flow lithography and versatile applications 2. Speaker :Jiseok Lee 3. Time : 16:00~17:00 4. Place :: e+ Lecture Hall.

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Presentation transcript:

SEMINAR 1. Title :Introduction of flow lithography and versatile applications 2. Speaker :Jiseok Lee 3. Time : 16:00~17:00 4. Place :: e+ Lecture Hall (room 83188), 2nd Research Building, Sungkyunkwan University 5. Summary : Precisely shaped polymeric particles and structures are widely used for applications in photonic materials, MEMS, biomaterials and self-assembly. Photolithography based flow lithography technology is a micro structure fabrication technique using a projection photolithography. This fabrication technique offers unprecedented control over structure size, shape and physicochemical anisotropy. This seminar provides a wide range of understanding for flow lithography techniques, materials of matrix, device fabrication and versatile applications of synthesized micro structures. For example, we report a novel particle encoding strategy by utilizing spatial patterning of rare-earth-doped upconverting nanocrystals (UCNs) via flow lithography and demonstrate applications in anti-counterfeiting and biosensing. Further, possible applications for battery, energy storage and decent bio-electrical application will be introduced. 6 Background : Organic synthesis, Optofluidics Education University of Michigan, Ann Arbor, MI 08/2011 Ph.D. in Macromolecular Science and Engineering Hanyang University, Seoul, Korea M.S. in Department of Chemical Engineering 08/2005 B.S. in Department of Chemical Engineering 08/2003 Work Ulsan National Institute of Science and Technology (UNIST): Assistant Professor 06/2014~present School of Energy and Chemical Engineering Massachusetts Institute of Technology: Post-doc 11/2011~05/2014 Research Advisor: Patrick S. Doyle (Chemical Engineering) Co-research Advisors: Professor Angela M. Belcher (Materials Science and Engineering)