Simulation results from double-sided and standard 3D detectors

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Presentation transcript:

Simulation results from double-sided and standard 3D detectors David Pennicard, University of Glasgow Celeste Fleta, Chris Parkes, Richard Bates – University of Glasgow G. Pellegrini, M. Lozano - CNM, Barcelona 10th RD50 Workshop, June 2007, Vilnius, Lithuania

Overview Simulations of different 3D detectors in ISE- TCAD Comparison of double-sided 3D and full-3D detectors before irradiation Radiation damage models Preliminary results of radiation damage modelling

Overview Simulations of different 3D detectors in ISE- TCAD Comparison of double-sided 3D and full-3D detectors before irradiation Radiation damage models Preliminary results of radiation damage modelling

Double-sided 3D detectors Proposed by CNM, also being produced by IRST Columns etched from opposite sides of the substrate Metal layer on back surface connects bias columns Backside biasing Medipix configuration (55m pitch) and 300m thickness

Double-sided 3D: Depletion behaviour ~2V lateral depletion (same as standard 3D) ~8V to deplete to back surface of device Doping 0V 1V 10V

Double-sided 3D: Electric field Standard 3D Similar behaviour in overlap region

Double-sided 3D: Electric field at front Low fields around front High field at column tip Similar behaviour is seen at the back side of the device Electric field matches full 3D where columns overlap

Double-sided 3D detectors: Collection time Simulated particle track passing midway between n+ and p+ columns Variation in charge collection time with choice of device structure The double-sided detector shows a similar response to the standard 3D, but the collection signal has a longer tail-off due to slow collection from the front and back surfaces. This effect is reduced if the columns length is increased relative to the substrate thickness. 2.5ns 0.75ns 250μm Double-sided 3D 1.0ns 0.40ns 270μm 300μm 290μm Column length 0.5ns 0.35ns Standard 3D 99% collection 90% collection Detector

Overview Simulations of different 3D detectors in ISE- TCAD Comparison of double-sided 3D and full-3D detectors before irradiation Radiation damage models Preliminary results of radiation damage modelling

University of Perugia trap models IEEE Trans. Nucl. Sci., vol. 53, pp. 2971–2976, 2006 “Numerical Simulation of Radiation Damage Effects in p-Type and n-Type FZ Silicon Detectors”, M. Petasecca, F. Moscatelli, D. Passeri, and G. U. Pignatel Ec Perugia P-type model (FZ) 0.9 2.5*10-15 2.5*10-14 CiOi Ec+0.36 Donor 5.0*10-14 5.0*10-15 VVV Ec-0.46 Acceptor 1.613 2.0*10-14 2.0*10-15 VV Ec-0.42 η (cm-1) σh (cm2) σe (cm2) Trap Energy (eV) Type - - - Ev The paper here is the most recent publication from the Unniversity of Perugia, but their previous simulation papers are also useful for reference. 2 Acceptor levels: Close to midgap Leakage current, negative charge (Neff), trapping of free electrons Donor level: Further from midgap Trapping of free holes

University of Perugia trap models Aspects of model: Leakage current – reasonably close to α=4.0*10-17A/cm Depletion voltage – matched to experimental results (M. Lozano et al., IEEE Trans. Nucl. Sci., vol. 52, pp. 1468–1473, 2005) Carrier trapping – Model reproduces CCE tests of 300m pad detectors But trapping times don’t match experimental results Link between model and experiment Experimental trapping times for p-type silicon (V. Cindro et al., IEEE NSS, Nov 2006) up to 1015neq/cm2 βe= 4.0*10-7cm2s-1 βh= 4.4*10-7cm2s-1 Calculated values from p-type trap model βe= 1.6*10-7cm2s-1 βh= 3.5*10-8cm2s-1 Deep Level Transient Spectroscopy [DLTS] Alpha here is the experimental value after 80min anneal at 60degC. Trapping rate could be lower at high fluences? (G. Kramberger, Trapping in silicon detectors, Aug. 23-24, 2006, Hamburg, Germany) Note the mismatch between electrons and holes NB – above 10^15 neq/cm2, difficult to measure trapping times. Evidence from other simulation work that trapping rates may be lower than expected at high fluences – pessimistic estimate here. Possibly alter the trap times to compensate? Results here show that further modification shouldn’t affect Vdep too much, so this could probably work. (30% lower, say?) Specify that the difference in beta will mean the trap model won’t generalise properly

Altering the trap models Priorities: Trapping time and depletion behaviour Leakage current should just be “sensible”: α = 2-10 *10-17A/cm Chose to alter cross-sections, while keeping σh/σe constant Carrier trapping: Space charge: Modified P-type model 0.9 3.23*10-14 3.23*10-13 CiOi Ec+0.36 Donor 5.0*10-14 5.0*10-15 VVV Ec-0.46 Acceptor 1.613 9.5*10-14 9.5*10-15 VV Ec-0.42 η (cm-1) σh (cm2) σe (cm2) Trap Energy (eV) Type Alpha range here is approximate range of values that you’d get under different annealing conditions

Modified P-type model and experimental data 0.9 3.23*10-14 3.23*10-13 CiOi Ec+0.36 Donor 5.0*10-14 5.0*10-15 VVV Ec-0.46 Acceptor 1.613 9.5*10-14 9.5*10-15 VV Ec-0.42 η (cm-1) σh (cm2) σe (cm2) Trap Energy (eV) Type “Comparison of Radiation Hardness of P-in-N, N-in-N, and N-in-P Silicon Pad Detectors”, M. Lozano et al., IEEE Trans. Nucl. Sci., vol. 52, pp. 1468– 1473, 2005 α=3.75*10-17A/cm Experimentally, α=3.99*10-17A/cm3 after 80 mins anneal at 60˚C (M. Moll thesis)

Perugia N-type model KC=(2.2±0.2)*10-2cm-1 Perugia N-type model (FZ) Donor removal 1.1 2.5*10-15 2.0*10-18 CiOi Ec+0.36 Donor 0.08 3.5*10-14 5.0*10-15 VVO Ec-0.50 Acceptor 13 1.2*10-14 2.0*10-15 VV Ec-0.42 η (cm-1) σh (cm2) σe (cm2) Trap Energy (eV) Type KC=(2.2±0.2)*10-2cm-1 Works similarly to the p-type model Donor removal is modelled by altering the substrate doping directly Experimental trapping times for n-type silicon (G. Kramberger et al., NIMA, vol. 481, pp297-305, 2002) βe= 4.0*10-7cm2s-1 βh= 5.3*10-7cm2s-1 Calculated values from n-type trap model βe= 5.3*10-7cm2s-1 βh= 4.5*10-8cm2s-1

Modified N-type model α=2.35*10-17A/cm 1.1 3.1*10-15 2.5*10-17 CiOi Ec+0.36 Donor 0.08 3.5*10-14 5.0*10-15 VVO Ec-0.5 Acceptor 13 0.9*10-14 1.5*10-15 VV Ec-0.42 η (cm-1) σh (cm2) σe (cm2) Trap Energy (eV) Type “Characterization of n and p-type diodes processed on Fz and MCz silicon after irradiation with 24 GeV/c and 26 MeV protons and with reactor neutrons”, Donato Creanza et al., 6th RD50 Helsinki June 2-4 2005 α=2.35*10-17A/cm Experimentally, α=3.99*10-17A/cm after 80 mins anneal at 60˚C (M. Moll thesis)

Bug in ISE-TCAD version 7 Currently using Dessis, in ISE-TCAD v7 (2001) Non time-dependent simulations with trapping are OK Error occurs in transient simulations with traps Carrier behaviour in depletion region is OK Displacement current is miscalculated This affects currents at the electrodes This bug is not present in the latest release of Synopsis TCAD (2007) Synopsis bought ISE TCAD, and renamed Dessis as “Sentaurus Device” Don’t know which specific release fixed the problem Correct behaviour: Error:

Test of charge trapping in Synopsis TCAD Simulated a simple diode with carriers generated at its midpoint No traps “Double step” seen because electrons are collected before holes

Test of charge trapping in Synopsis TCAD Simulated a simple diode with carriers generated at its midpoint Acceptor and donor traps further from the midgap Produces charge trapping but little change in Neff Trap levels should give τe≈ τh ≈ 1ns ISE TCAD traps ?!

Test of charge trapping in Synopsis TCAD Simulated a simple diode with carriers generated at its midpoint Acceptor and donor traps further from the midgap Produces charge trapping but little change in Neff Trap levels should give τe≈ τh ≈ 1ns Synopsis traps With traps, signal decays as exp (-t/1ns) as expected 

Overview Simulations of different 3D detectors in ISE- TCAD Comparison of double-sided 3D and full-3D detectors before irradiation Radiation damage models Preliminary results of radiation damage modelling

Full 3D – Depletion voltage (p-type) Depletion voltage is low, but strongly dependent on pitch Double sided 3D shows the same lateral depletion voltage as full 3D 133m 50m The “3 column ATLAS” device shown here uses the same electrode spacing as detectors tested by Cinzia da Via’s group. 55m

Full 3D – electric field at 100V Full depletion is achieved well under 100V, but electric field is altered No damage 1016 neq/cm2

Double-sided 3D – front surface Once again, double-sided devices show different behaviour at front and back surfaces No damage 1016 neq/cm2

Double-sided 3D – back surface Region at back surface depletes more slowly – not fully depleted at 100V bias No damage 1016 neq/cm2 Undepleted

Further work 3 8 Simulate charge collection! Consider effects of different available pixel layouts CCE, depletion voltage, insensitive area, capacitance 133m 3 50m 8

Conclusions Double-sided 3D detectors: Behaviour mostly similar to standard 3D Depletion to back surface requires a higher bias Front and back surfaces show slower charge collection Radiation damage model Trap behaviour is directly simulated in ISE-TCAD Trap models based on Perugia models, altered to match experimental trapping times Preliminary tests of damage model with 3D Relatively low depletion voltages, but electric field pattern is altered Double-sided 3D shows undepleted region at back surface at high fluences

Thank you for listening

Additional slides

3D detectors Planar 3D N+ and p+ columns pass through substrate Fast charge collection Low depletion voltage Low charge sharing Additional processing (DRIE for hole etching) Planar 3D Could omit

Breakdown in double-sided 3D Breakdown occurs at column tips around 230V Dependent on shape, e.g. 185V for square columns

Breakdown in double-sided 3D With 1012cm-2 charge, breakdown at 210V Front Back P-stop Column tips P+ base

Example of ISE TCAD bug In simulation, charge deposited at the front

Example of ISE TCAD bug P+ N+ Holes drift 300μm

Example of ISE TCAD bug

Full 3D – Depletion voltage (p-type) Depletion voltage is low, but strongly dependent on pitch Double sided 3D shows the same lateral depletion voltage as full 3D 133m 50m 55m

Weighting fields and electrode layouts Symmetrical layout of n+ and p+ Weighting potential is the same for electrons and holes Electric field, 100V bias Weighting potential

Weighting fields and electrode layouts 3 bias columns per readout column Weighing potential favours electron collection Electric field, 100V bias Weighting potential

Future work – Design choices with 3D Choice of electrode layout: In general, two main layouts possible Second option doubles number of columns However, increasing no. of p+ columns means larger electron signal Could shorten / omit

Future work – Design choices with 3D ATLAS pixel (400m * 50m) allows a variety of layouts No of n+ electrodes per pixel could vary from ~3-8 Have to consider Vdep, speed, total column area, capacitance FP420 / ATLAS run at Stanford already has different layouts CMS (100 m * 150m) 133m 3 50m 50m Could shorten / omit 8