The coating thermal noise R&D for the 3rd generation: a multitechnique investigation E. Cesarini 1,2), M.Prato 3), M. Lorenzini 2) 1)Università di Urbino.

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Presentation transcript:

The coating thermal noise R&D for the 3rd generation: a multitechnique investigation E. Cesarini 1,2), M.Prato 3), M. Lorenzini 2) 1)Università di Urbino 2) INFN Firenze 3)INFN Genova on behalf of CoaCh collaboration

Modeling Hints for Production/ Post-production New samples Single layer sample set Characterization Modification/ alteration Substrate with a single layer of Ta 2 O 5, crafted to enhance the layer characteristics and to be easily handled Mechanical, bulk, optical, surface and interface properties Global alterations : Thermal processing/annealing in vacuum or controlled atmosphere EM radiation exposure (X-rays, UV) Local alterations : Laser heating/damaging Ion implantation The CoaCh project 01/03/20102ET WP2-WP3 Joint Meeting - Jena

The CoaCh for the 3 rd generation 01/03/20103ET WP2-WP3 Joint Meeting - Jena High Brownian Coating Noise Higher Brownian Noise Simulation at 18K see talk J. Franc or ET

Facilities Properties DescriptionFacility ChemicalBonding state To evaluate the presence of dangling bonds or the oxidation state XPS in Genova Structural Short range ordering To quantify the degree of amorphousness SEM (Modena/Pisa) XRD in Pisa TribologicalRoughnessNano and micro scaleAFM in Genova Optical Index of refraction nmSE in Genova ThermalConductivityThermal conductivity 4 KFirenze Mechanical Young’s modulus and density Measured through the effects on mode frequencies Q measurement setup/AFM Mechanical lossLoss angle measurements Q measurement in FI PG & PD (Low & Cryo T) 01/03/20104ET WP2-WP3 Joint Meeting - Jena

Preliminary results on 200 nm Ta 2 O 5 mono-layer  Q-measurements facility in Firenze  Annealing treatment in vacuum  SE analysis in Genova  XPS analysis in Genova  Future upgrades 01/03/20105ET WP2-WP3 Joint Meeting - Jena

Q measurements with GeNS equilibrium condition: D>t GeNS (INFN FI) Q measurements at room temperature with a nodal suspension controlled in temperature  The reproducibility between two different suspensions is within 20%  Q value is not depending on suspension point  The deposited coating is preserved  Maximum measured Q value for a thin disk is about 20∙10 6 E. Cesarini et al. REVIEW OF SCIENTIFIC INSTRUMENTS 80, (2009) 01/03/20106ET WP2-WP3 Joint Meeting - Jena

Q measurements with GeNS Substrate loss angle Substrate+500nm Ta2O5 loss angle Substrate+200nm Ta2O5 loss angle 01/03/20107ET WP2-WP3 Joint Meeting - Jena CORNING substrate + Ta2O5 mono-layer ion beam sputtered by ATFilms

Annealing treatment in vacuum 01/03/20108ET WP2-WP3 Joint Meeting - Jena ANNEALING CURVE HEATING 500 °C for 1 h SLOW COOLING NATURAL COOLING WHY 500°C ? From literature amorphous Ta2O5 crystallised at ≈ 650°C so we made a conservative choice Martin et al. Class. Quantum Grav. 26 (2009) Martin et al. Class. Quantum Grav. 25 (2008) VACUUM SYSTEM TUBE FURNACE Loss angle vs Frequency

SE analysis 01/03/20109ET WP2-WP3 Joint Meeting - Jena Fresnel reflection coefficients SE studies the polarization of the beam reflected by the specimen BEFORE ANNEALING AFTER ANNEALING OPTICAL MODEL FITTED not annealed disk: annealed disk: Surface roughness d = 1.6 nm Ta 2 O 5 – thickness = 196 nm (20÷40 nm 1-2% voids layer) Corning substrate Surface roughness d = 0.9 nm Ta 2 O 5 – thickness = 196 nm (20÷40 nm 1-2% voids layer) Corning substrate

XPS analysis 01/03/201010ET WP2-WP3 Joint Meeting - Jena X-Rays Photo-electron Spectroscopy (XPS) used to study the chemical composition of the surface High resolution image of Ta4f and O1s peak Ta 2 O nm amorphous layer Ta 2 O 5 amorphous powder metallic Tantalium NO CHANGING AFTER THE ANNEALING

further possible investigation 01/03/201011ET WP2-WP3 Joint Meeting - Jena  Control of the structural properties XRD (Pisa, M. Tonelli)  Direct measurement of the layers thickness to fit the optical properties (Modena, Pisa SEM)  Changing of the Annealing procedure:  Annealing temperature  Quick cooling rate to preserve amorphous structure

Upgrades 01/03/201012ET WP2-WP3 Joint Meeting - Jena GENS at cryogenic temperatures (see talk by M. Lorenzini), silicon substrates Furnace chamber to connect to XPS machine, to control any chemical structure changes during the heat treatment Possibility to introduce a small cryostat to cool the sample during SE analysis to investigate optical properties at low temperature Introduction of the possibility to do annealing in a controlled atmosphere (e.g. N2) Correlation with structural properties

EXAFS 01/03/201013ET WP2-WP3 Joint Meeting - Jena This powerful technique for probing the local structure. It gives information on the number and chemical identities of near neighbours and the average interatomic distances up to 5-6 Å The X-ray source is synchrotron radiation, allowing the EXAFS technique to be used for atoms in any aggregation state (solid, liquid or gas) in all kinds of environment: crystalline solids, glasses, amorphous phases, liquids and solutions. Extended X-ray absorption fine structure spectroscopy Threshold behaviour ABSORPTION interference between scattered photons and photons reflected by neighbouring sites

Conclusion 01/03/201014ET WP2-WP3 Joint Meeting - Jena  A multi-technique approach (CoaCh project) on coating thermal noise problem is on-going for 2 nd and 3 rd generation of GW detectors  First preliminary results can be useful to understand which properties to correlate and which analyses are needed  Upgrades of set up are beginning