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Parameter [units]Tune-up beam"low" chargehigh currenthigh charge Kin. injection energy [MeV]2.0 – 3.02.0-3.02.02.0-3.0 Maximum beam energy [MeV]16 – 2016-20.

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Presentation on theme: "Parameter [units]Tune-up beam"low" chargehigh currenthigh charge Kin. injection energy [MeV]2.0 – 3.02.0-3.02.02.0-3.0 Maximum beam energy [MeV]16 – 2016-20."— Presentation transcript:

1 Parameter [units]Tune-up beam"low" chargehigh currenthigh charge Kin. injection energy [MeV]2.0 – 3.02.0-3.02.02.0-3.0 Maximum beam energy [MeV]16 – 2016-20 Bunching freq [MHz]10 -6 - 9.3839.383351.88 / 703.769.383 Bunch charge [nC]0.1 - 1.41.41.4 / 0.75 Average beam current [mA]10 -7 – 141450050 Bunch parameters at 2.5 MeV  x /  y, normalized, [mm-mrad] 1/1 – 2/22/2 6/6 Bunch length, full/rms, [ps]~60-120/20-40 ~80-150/30-55 Energy spread, full/rms, dE/E0.03-0.08/ 0.005-0.01 0.03-0.08/ 0.005-0.01 0.03-0.08/ 0.005-0.01 0.08-0.01 Bunch parameters at 20 MeV  x /  y, normalized, [mm-mrad] 1/1-2/22/2 6/6 Bunch length, full/rms, [ps]~60/20 - 120/40~120/40 ~150/55 Energy spread, full/rms, dE/E0.06/0.01 0.08/0.015 Machine Parameters

2 AP requirements (High Energy Ring) ParameterExpected Value / RangeAccuracyResolutionComments Beam Loss (localized) 50 nA (trip level) / 0-2500 nA (range) 20%0.5 nA BLM trip level is 50 nA. Factor of 50 down required for smooth transition during laser frequency increase. Laser specs are not completely clear at this point. Beam Position Transverse, 1 st -time tuning Full aperture, Bunch rep. rate 1 Hz 500 μm50 μmFlags could be used to bring the beam around. Transverse, Regular Operations/Tuning Aperture: ±1.5 cm, ≥10 Hz, two beams 100 μm20 μm Ideally, position of accel./decel. beams simultaneously. Ability to operate with bunch trains. Refresh rate not lower than 1 Hz. Ability to improve accy. by averaging. accel./decel. phase±90° / 360°1°1°0.25° Beam Profile Beam emittance2 – 10 μm, norm30%0.1 μm, normε=2 μm is nominal. Quad/Sol. scan. See next line. Transverse Beam Profile Size (rms): 0.1-5.0 mm. (Aprt. ±1.0 cm) 10% (LP)5 μm (LP) High resolution is required for quad scan and beam matching in the low power (LP) mode. In the high power regime (HP), lower accy./res. can be sufficient. Beam Halo Profile30% 1 ppm of max. densityA set of scanner wires with a BLM? Longitudinal profile50-150 psec10 psec2 psecRequired at LP and HP. Energy spread (dE/E)1% (rms)1e-32e-4Required at LP and HP. Current/Charge per bunch Current (Ops.)0 – 500 mA1% 0.1% at I=500 mA / 0.25 μA at I=0 mA Lower range needed for tuning (see next page) Tot. Current Loss< 1 μA (expected)1%0.25 μARequires nulling feedback, nulling cur. in both DCCTs Bunch charge 0.1 – 5 nC, 1 Hz – 10 MHz 5%0.1% (at 5 nC) Resolution of 0.1% is desirable for RHIIC II R&D. 1% will be sufficient for ERL. Other HOM power BTFImpedance measurements? Kicker in the injector? M56 (over 2 arcs)±20 cm10%0.5 cmLongitudinal BTF. Non-linear terms too.

3 AP requirements (Low Energy Injection Transport / Dump) ParameterExpected Value/RangeAccuracyResolutionComments Beam Loss (localized) 0.5 μA (trip level) / 0 - 25 μA (range) 20%5 nA BLM trip level is 0.5 μA. Factor of 50 down required for smooth transition during laser frequency increase. Beam Position Transverse, 1 st -time tuning Full aperture, Bunch rep. rate 1 Hz 500 μm50 μmFlags could be used to bring the beam through Transverse, Regular tuning and Operations Aperture: ±1.5 cm, ≥10 Hz 200 μm50 μm Ability to operate with bunch trains. Refresh rate not lower than 1 Hz. accel. phase1°1°0.25° Beam Profile Beam emittance2 – 10 μm, norm30%0.1 μm, norm Pepper pot in the injection line. Projected emittance will be larger than the slice emittance. Transverse Beam Profile Size (rms): 2.0-5.0 mm.5% (LP)20 μm (LP) Required in the low power (LP) only. In the high power regime (HP), position will be sufficient. Beam Halo, measure/remove Full apperture,20% 1 nA, assuming 2π scraper A factor of 10 better resolution is required for RHIC II R&D. Current/Charge per bunch Current (Tuning)0 - 1 μA5%0.5 nARing BLM tuning will require damping 50 nA locally. Current (Ops.)0 – 500 mA1% 0.1% at I=500 mA / 0.25 μA at I=0 mA Bunch charge0.1 – 5 nC, 1 Hz -10 MHz5%0.1% (at 5 nC) Resolution of 0.1% is desirable for RHIIC II R&D. 1% will be sufficient for ERL. Ghost bunches~10 nA @ 10 MHz20%1 nA @ 10 MHzMust be measured separately from main bunches. Other Gun HOM excitation Beam position at the chicane BPMs as afunction of beam current/ bunch rep. rate? BTFImpedance measurements. Kicker in the injector?


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