1. Optimization of the EE 432 Class Fabrication Process May 07 – 16 Advisor/Client Professor Tuttle Team Members Jerome Helbert Leah Henze Ryan McDermott Alexander Smith 1

2. Project Overview Objective: To improve the fabrication process used by students in the Microelectronics Fabrication lab (EE 432) The class creates transistors, resistors and capacitors using a series of boron and phosphorus diffusions Problems with current process: Badly scratched photolithography mask Low tolerance for alignment errors Non-ohmic contacts Non-uniform p-type diffusions 2

3. Project Overview Anticipated End Users EE 432 Course Instructors EE 432 Lab TAs Students in the EE 432 Class General Approach Photolithography Mask Set Design a new mask set Contacts and P-wells Identify solutions through experimentation, simulations and research Propose changes to the CMOS 70 fabrication process 3

4. Project Milestones Fall Semester P-wells and Contacts Perform characterization experiments Mask Select relevant devices for inclusion Produce mask design Fabricate mask (Contingent upon resource availability) Spring Semester P-wells and Contacts Continue experimentation Perform simulations using SUPREM Research contact materials 4

5. Contact and P-Well Considerations Technical Requirements Contacts must be Ohmic To provide good contact with devices P-wells must be uniform across the wafer and provide appropriate background doping for the formation of devices The process must be consistent and repeatable between runs Economic Considerations Proposed process changes should not require expensive or unavailable equipment or materials There is not funding available to provide these materials to the fabrication class. 5

6. Contact and P-Well Considerations End Use Consideration The final process should be compatible with the current CMOS 70 process Require a similar amount of time to complete as there is a finite amount of lab time each semester Make use the equipment available in the NSF lab Final process should be documented For use by the course instructor, detailing why changes were made For use by students Process instructions for use in the lab 6

7. Ohmic vs Non-Ohmic Contacts Ohmic contacts (shown in red) produce a linear relationship between voltage and current Non-Ohmic Contacts (shown in blue) cause unpredictable relationships between voltage and current 7

8. Contact Experiment Tested the characteristics of the contacts on wafers of differing concentrations of dopants One heavily doped n-type wafer, one lightly doped n-type wafer, and one heavily doped p-type wafer The heavily doped n-type wafer exhibited excellent ohmic characteristics before and after sintering The lightly doped n-type wafer exhibited complete non-ohmic characteristics before and after sintering The heavily doped p-type wafer exhibited complete non-ohmic characteristics before sintering, but excellent ohmic characteristics after sintering The p-type wafer revealed a severe non-uniformity in the contact resistivity values 8

9. Non-Uniformity of P-type Diffusions Die Arrangement 1234 5678 9101112 13141516 9

10. Sintering Issues Sintering caused artifacts to form on some of the n- type contact wafers These did not affect device performance Could have been caused by water vapor underneath the metal layer Will be investigated in future experiments 10

11. Boron Uniformity Experiment A new set of boron source wafers were prepared to replace the aging source wafers Source wafers recommend using a fully loaded wafer boat for deposition, the lab has usually used a partially loaded boat Compared diffusion characteristics of a fully loaded wafer boat to a partially loaded wafer boat Experiment showed slight improvement in uniformity using the fully loaded boat. A fully loaded wafer boat will be used from now on 11

12. Boron Uniformity with Alternate Diffusion Boat Experiment Current wafer boats allowed wafers to move around, this allowed gas flow patterns to vary Older wafer boats held wafers firmly in one place, creating a more uniform gas flow pattern Old wafer boat resulted in a more uniform diffusion. It will be used for boron depositions from now on 12

13. Future Experiments Contact Improvement Experiment Examine effect of thickened aluminum layer and increased etch time NMOS Diffusion Characterization Experiment Begin testing the effects of our process changes on simple devices Contact Material Experiment Test the effectiveness of alternative metals on contact performance Boron Deposition Parameter Variation Experiment Through experimentation, find the ideal deposition parameters for creating large and small boron diffusions 13

14. Photolithography Mask Redesign Old mask characteristics N/PMOS sizes ranged from 10μm to 80μm in width Contains many devices that are unlikely to be test in EE 432 (NAND, NOR etc.) Much area was empty on the wafer Over time mask has developed scratches from lab use 14

15. New Mask Constraints No more than the established 6 masks More masks would increase the cost No need to make the process more complicated with another step Die layout shall not exceed 3.81 cm by 3.81 cm to keep border region same on existing mask Must have large areas for proper vision through the mask while alignment 15

16. New Mask Considerations Should the process switch to a PMOS process?  This would eliminate the p-well thus removing a current problem in the process  Simpler process would increase number of working devices  Lab component of EE432 would be drastically shortened  CMOS is the current standard in industry Decided to continue the CMOS process to keep EE 432 lab relevant to current industry process 16

17. Device & Size Consideration Should all devices be kept?  Some devices are interesting to look at  Are not typically tested in class and not required  Take up room that could be used to fit more devices Decided to remove all but the NMOS, PMOS, BJT, capacitors, one inverter, one NAND, Van der Paws and TLM devices 17

18. Cadence or L-Edit? Cadence  More accessible on campus computers  When a test design was imported it included an unneeded layer L-Edit  Established program at MRC for mask generation  Old mask files were found Decided to use L-Edit since old files could easily be edited to form the new design 18

19. Mask Design Changes Smallest device features (vias) were increased Generator limit of 4 μm feature size Via size could be affecting the contact reliability Wafer layout Die layout was changed to make it smaller to fit more die per wafer New devices A new set of N/PMOS with longer channel lengths (20 & 40 μm) were included 19

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21. Design Summary Contact/Diffusion Summary Increased aluminum thickness and increased etch time to improve contact reliability Using alternate wafer boat and using more guard wafers to create an even gas flow to increase diffusion uniformity Still need to perform more research and simulations on contacts and diffusions, as well as update process documentation Mask Redesign Summary Completed mask redesign Smaller die sizes allow for more die on each wafer Eliminated unused devices Increased tolerance of each device Still need to prepare documentation, fabricate masks, and test masks 21

22. Design Evaluation The project has exceeded the requirement for a successful design by 8.0% 22