1. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 The status of academic and industrial force metrology below 1 N and the corresponding strategy at KRISS TC3 Round Table Discussion Meeting Speaker: Min-Seok Kim Korea Research Institute of Standards and Science

2. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Micro- or nano mechanical testing – Newton Micro tensile testing in KRISS Micro tensile tester (ESPI) 0.018 2 0.5 (Unit : mm) Specimen (Copper) By courtesy of Dr. Yong-Hak Huh

3. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Micro- or nano mechanical testing: micro-Newton Nanoindentation experiments in KRISS Nanoindenter (MTS) Specimen (ZnO thin film, 0.8  m) By courtesy of Dr. Jun-Hee Hahn 0.8  m

4. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Micro- or nano mechanical testing: nano Newton Measurement of tensile properties of carbon nanotube in KRISS Nano-manipulator & force sensor Specimen (MWCNT) By courtesy of Dr. Seung-Hun Nam Tip MWCNT

5. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Micro- or nano mechanical testing: pico-Newton Mechanical testing of stem cells in PSIA Corp. (AFM company) Atomic force microscope (PSIA) Specimen (embryonic stem cell) By courtesy of Dr. Sang-Jun Cho Adhesion effect between tip and sample Step force: ~ 300 pN Force-Distance curve of the stem cell Young’s modulus of the stell cell from the F-D curve : 10 ~ 18 kPa

6. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Problems due to the lack of force traceability (1) Young’s modulus measurements in AFM Same specimen Different cantilever Data by courtesy of Dr. Sang-Jun Cho, PSIA Corp. For the reasonable data Needs Force Calibration or Stiffness Calibration!

7. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Problems due to the lack of force traceability (2) Mechanical testing of “Spacers” for TFT-LCD display panels Schematic diagram of a TFT-LCD panel Testing setup Load-displacement diagrams of the same spacer from two different indentation instruments TFT Glass ITO Spacer 0 10 20 30 40 50 60 0100200300400500600700800 Displacement (nm) Load (mN) MTS (L.R. = 4.5 mN/s) B company (L.R. = 4.4 mN/s) Flat Punch Tip 40 ㎛ x 40 ㎛ By courtesy of Dr. Jun-Hee Hahn Loading Unloading

8. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006  Calibration of micro cantilevers and force sensors  Uncertainty evaluation reported (Metrologia, Vol. 43, pp. 389-95)  Force measuring capability of the balance below 10  N is under test  Calibration service will be available next year  Calibration of micro cantilevers and force sensors  Uncertainty evaluation reported (Metrologia, Vol. 43, pp. 389-95)  Force measuring capability of the balance below 10  N is under test  Calibration service will be available next year Status in KRISS – AFM cantilever calibration Nano Force Calibrator Spring constant calibration of a rhombus-shaped cantilever that is specially designed for mechanical testing in AFM

9. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006  Piezoresisitive cantilever to be used as transfer standards  Sensor properties are under test  Developing force balancing cantilevers is scheduled next year  Piezoresisitive cantilever to be used as transfer standards  Sensor properties are under test  Developing force balancing cantilevers is scheduled next year Status in KRISS – Transfer standards Nano Force Sensor PCB pad Force sensor Gold wires Fabricated piezoresistive cantileverSensor assembly

10. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006  Based on magnetic flux quantization of a superconducting annulus  Step size ~0.2 pN (at 10 T/m); range ~ 0.2 - 40 pN  Target uncertainty: less than 1 %  Project launched in 2006  Based on magnetic flux quantization of a superconducting annulus  Step size ~0.2 pN (at 10 T/m); range ~ 0.2 - 40 pN  Target uncertainty: less than 1 %  Project launched in 2006 Status in KRISS – New standards Quantized force realization in pico-and femto-Newton range Fabricated ultra-soft cantilever 400 um× 4 um × 0.34 um Magnetic moment steps (n = 0,1, 2…) Optic interferometer Super-currents z-gradient magnet Stepwise force Superconducting loop or SQUID Ultra-soft cantilever dz dB ext F = n  184 fN Visit us in poster session for details

11. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Small force standards development strategies Force 100 N 1 N1 mN1  N1 nN1 pN1 fN Realization Micro mechanical testing Nano indentation Nano mechanical testing based on AFM Applications Optical tweezer Magnetic resonance force microscope Micro thrusters for satellites 1 aN Standard Quantized magnetic force Electrostatic force 10  N10 pN 5 N Nano-balance 10 N Nano Force Calibrator Superconducting ring Magnet for z-gradient Ultrasoft cantilever Superconducting ring Deadweight force Electromagnetic compensation balance 50 mN

12. IMEKO XVIII World Congress Metrology for a sustainable development Rio de Janeiro, Brazil, Sept. 17-22, 2006 Closing Remarks  Industrial needs for traceable small force metrology will be emerging  However, when ??  What would be the uncertainty level of small force metrology which industries require ?  Accurate force metrology would be a solid foundation of reliable and high-qualified production of nanotechnology-based goods  Industrial needs for traceable small force metrology will be emerging  However, when ??  What would be the uncertainty level of small force metrology which industries require ?  Accurate force metrology would be a solid foundation of reliable and high-qualified production of nanotechnology-based goods