2. Goal Have a patterned material that blocks infrared light.

3. Project Outline  Thick 1D structures (50-100 microns)  Variety of 2D structures (2-20 microns)  Phase mask creation  Thick 3D structures (50-100 microns) via phase mask interference lithography  Sol gel process to create 3D structures from other materials  Testing of photonic and mechanical properties

4. Calculations 2 µm spacing 2-D & 3-D material. n λ = 2 d sinθ ~2000 nm wavelength range infrared region

5. Potential Obstacles Attaining a thick photoresist layer uniformity issues adhesion problems Time Constraints Run time of experiments Gaining access to laboratories and becoming trained on equipment

6. Potential Obstacles New Field of Research (Interference Lithography, Metamaterials) Trial and error Limited background info Large Room for Error Multistep process Measurements and spacing must be very precise to get desired results

7. Current Plans Continue designing 2D print models and create 2D phase masks Research photoresist application methods and Interference Lithography