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Ion beam assisted deposition of thin films on solid and nonrigid substrates I.S.Tashlykov, S.M.Baraishuk Belarusian State Pedagogical University, 220050.

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Presentation on theme: "Ion beam assisted deposition of thin films on solid and nonrigid substrates I.S.Tashlykov, S.M.Baraishuk Belarusian State Pedagogical University, 220050."— Presentation transcript:

1 Ion beam assisted deposition of thin films on solid and nonrigid substrates I.S.Tashlykov, S.M.Baraishuk Belarusian State Pedagogical University, 220050 Minsk Sovetskaya 18

2 Schematic representation of SIAD: 1—vacuum arc ion source, 2—ionized fraction, 3—neutral fraction, 4—target, 5—target holder, 6—modified surface, 7—current integrator, 8—high voltage power supply, 9—electric field.

3 . RBS spectra of the initial rubber (1) and a sample upon which the Mo coating was deposited and also irradiated with 3 keV Mo+ ions (2)

4 The depth distribution of indicated components in the rubber sample (a) and in the silicon sample (b) with Mo coatings.

5 RBS spectra of untreated Si – curve (1); and with deposited Ti-based thin film – curve (2).

6 Relative content of species in SIAD Ti-based thin film on Si (4 hours deposition).

7 H – content in SIAD Ti-based layer deposited on Si (2 hour deposition).

8 Cross-section high-resolution TEM micrograph of (100) Si sample with SIAD constructed Zr/Si structure (accelerated voltage of 5 keV). Image of the interface area of the Zr-based film and Si substrate (a), image of the central area of the film [9]. The Low scale Zr crystal inserts in the coating are shown in circuits.

9 AFM images of surface morphology and view profiles of topography of rubber: untreated surface (a), the surface after 3 hours of Mo-based coating deposition (b).

10 AFM images of surface morphology and view profiles of topography of silicon: untreated surface (a), the surface after 3 and a half hours titanium-based coating deposition (b).

11 Changes of average surface roughness (rave), the root mean square value of the surface roughness (means square) and (square area)/(projected area) (rho) of rubber and silicon surfaces, modified by means of SIAD of coatings.

12 SEM image of rubber surface modified by Cr. ECr+ = 10 keV.

13 Thicknesses of the coatings.

14 PPT-curves for SIAD Me-based coatings on rubber. R- pin fixed on virgin rubber.

15 Adhesion of Me SIAD coatings on rubber measured using the Pin Pull Test. ETi+,Mo+,W+ =20 keV, ECr+,Zr+ = 10 keV. R-Pin Pull Test on initial rubber.

16 Contact angle of water to Me-based SIAD coatings on rubber.

17 Thank you for your attention! tashl@bspu.unibel.by


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