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CONTROL OF ELECTRON ENERGY DISTRIBUTIONS IN INDUCTIVELY COUPLED PLASMAS USING TANDEM SOURCES* Michael D. Logue (a), Mark J. Kushner (a), Weiye Zhu (b),

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Presentation on theme: "CONTROL OF ELECTRON ENERGY DISTRIBUTIONS IN INDUCTIVELY COUPLED PLASMAS USING TANDEM SOURCES* Michael D. Logue (a), Mark J. Kushner (a), Weiye Zhu (b),"— Presentation transcript:

1 CONTROL OF ELECTRON ENERGY DISTRIBUTIONS IN INDUCTIVELY COUPLED PLASMAS USING TANDEM SOURCES* Michael D. Logue (a), Mark J. Kushner (a), Weiye Zhu (b), Hyungjoo Shin (c), Lei Liu (b), Shyam Sridhar (b), Vincent M. Donnelly (b), Demetre Economou (b) (a) University of Michigan, Ann Arbor, MI 48109 mdlogue@umich.edu, mjkush@umich.edu (b) University of Houston, Houston, TX 77204 (c) Lam Research Corporation Fremont, CA 94538 June 2013 * Work supported by the DOE Office of Fusion Energy Science, SRC and NSF. ICOPS_2013 University of Michigan Institute for Plasma Science & Engr.

2  Control of electron energy distributions (EEDs)  Tandem inductively coupled plasma (ICP) sources  Description of model and geometry  Plasma Parameters (T e, n e ) during pulse period  f e (  ) during pulse period  f e (  ) vs. position  Concluding Remarks AGENDA University of Michigan Institute for Plasma Science & Engr. ICOPS_2013

3 CONTROL OF EEDs – TANDEM SOURCES  Externally sustained discharges, such as electron beam sustained discharges for high pressure lasers, control f e (  ) by augmenting ionization so that f e (  ) can be better matched to lower threshold processes. University of Michigan Institute for Plasma Science & Engr. ICOPS_2013  Based on this principle, the tandem (dual) ICP source has been developed, T-ICP  In the T-ICP, the secondary source is coupled to the primary source through a grid to control the transfer of species between sources.  The intent is to control f e (  ) in the primary source.  Computational results for a tandem ICP system will be compared with experimental data under cw and pulsed power conditions. Secondary ICP Primary ICP Grid fe()fe()

4 DESCRIPTION OF HPEM  Modular simulator that combines fluid and kinetic approaches.  Resolves cycle-dependent phenomena while using time-slicing techniques to advance to the steady state.  Electron energy distributions are obtained as a function of space, time using a Monte Carlo simulation. University of Michigan Institute for Plasma Science & Engr. ICOPS_2013

5  T-ICP has separately powered coils with a biasable grid separating the two source regions.  Primary ICP is the lower source, secondary ICP is upper source.  A biasable boundary electrode is at the top boundary.  Electron, ion densities, temperatures: Langmuir probe  Argon, 10 mTorr, 80 sccm TANDEM ICP (T-ICP): EXPERIMENT Dimensions in cm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013

6  Cylindrically symmetric (mesh 8.7 cm x 58.5 cm)  Operating conditions:  Primary (lower):  90 W (CW)  100 W (pulse average), Duty cycle = 20%, PRF = 10 kHz  Secondary (top)  Power = 100 W or 500 W (CW)  Grounded grid.  Argon, 10 mTorr, 80 sccm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013 TANDEM ICP (T-ICP): MODEL

7 n e, S e, T e (TOP 500 W, CW; BOTTOM 90 W, CW)  With CW power top and bottom and grounded grid, the characteristics of the plasmas are determined by local coils.  Dominant ionization regions are well separated, though high thermal conductivity of plasma spreads T e between sources.  Grid Spacing: 3.12 mm  Argon, 10 mTorr, 80 sccm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013 TeTe nene  Electron Source

8  Presence of grid has noticeable influence on spatial profiles of n e, T e, and V P near grid area.  Grid Spacing: 3.12 mm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013 T e, n e, V P (TOP 500 W, CW; BOTTOM 90 W, CW)

9 f e (  ) (TOP 500 W, CW; BOTTOM 90 W, CW): H=10.8 cm  f e (  ) in middle of bottom ICP is substantially the same with or without top source. Perhaps some lifting of the tail of f e (  ) with top source?  With only top source, high energy tail of f e (  ) persists due to long mean free path of high energy electrons.  Grid Spacing: 3.12 mm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013  Experiment ICP (Bottom) ICP (Top) ICP (Both)  Model

10 f e (  ) (TOP 500 W, CW; BOTTOM 90 W, CW): H=14.8 cm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013  As height increases, tail of f e (  ) rises as flux of high energy electrons from top source is larger.  Grid Spacing: 3.12 mm  Ar, 10 mTorr  Model  Experiment ICP (Bottom) ICP (Top) ICP (Both)

11  T e increases slightly in main ICP area late in the afterglow period  Grid Spacing: 3.12 mm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013  20μs  24μs 50μs50μs  98μs  20μs  24μs 50μs50μs  98μs T e, n e, (TOP 500 W, CW; BOTTOM 100 W, PULSED) ANIMATION SLIDE-GIF

12 T e (TOP 500 W, CW; BOTTOM 100 W, PULSED)  With top ICP, T e increases in late afterglow. As plasma decays in bottom ICP, the constant flux of high energy electrons from top ICP has more influence.  Result is sensitive to presence of grid, which would affect the transport of high energy electrons.  Grid Spacing: 3.12 mm ; 5.46 mm  Ar, 10 mTorr, H = 10.8 cm  Experiment ICP (Bottom) ICP (Both) University of Michigan Institute for Plasma Science & Engr. ICOPS_2013  Model

13  In model n e = n i  n e is little affected by presence of top ICP – changes occur dominantly in f e (  ).  Grid Spacing: 3.12 mm  Ar, 10 mTorr, H = 10.8 cm n e (TOP 500 W, CW; BOTTOM 100 W, PULSED) University of Michigan Institute for Plasma Science & Engr.  Experiment ICP (Bottom) n e ICP (Bottom) N i ICP (Both) n e ICP (Both) N i ICOPS_2013  Model

14 ICOPS_2013 University of Michigan Institute for Plasma Science & Engr.  Top: 0 W  Bot: 90 W, CW f e (  ) (TOP: 0 W, 500 W, CW; BOTTOM: 90 W, CW; 100 W PULSED  Top: 500 W  Bot: 90 W, CW  Top: 0 W  Bot: 100 W, Pulsed  Top: 500 W  Bot: 100 W, Pulsed  Effect of top ICP on f e (  ) has some height dependence, with the tail of f e (  ) being raised higher as you move toward the top ICP.  Grid Spacing: 5.46 mm

15 f e (  ) (TOP 0 W; BOTTOM 100 W, PULSED)  Ar, 10 mTorr, H = 10.8 cm, PRF = 10 kHz, DC = 20%.  Grid Spacing: 3.12 mm University of Michigan Institute for Plasma Science & Engr.  Model  f e (  ) show expected time dependent behavior for a pulsed, single source system  f e (  ) has long tail at t = 20 μs near the end of the pulse on period  Tail of f e (  ) rapidly lowers in afterglow as high energy electrons are lost.  Little change in f e (  ) in late afterglow between t = 50 μs and t = 98 μs ICOPS_2013

16  Top ICP lifts the tail of the bottom f e (  ) during afterglow with effect greatest late in the afterglow.  Threshold of about 100 W in top ICP. (f e (  ) for 100 W top ICP are not that different from 0 W. Some statistical noise at t = 50μs)  Ar, 10 mTorr, H = 10.8 cm, R = 0.5 cm, PRF = 10 kHz, DC = 20%.  Grid Spacing: 3.12 mm University of Michigan Institute for Plasma Science & Engr.  Top 100 W f e (  ) (TOP CW; BOTTOM 100 W, PULSED): H=10.8 cm  Top 500 W ICOPS_2013

17  As approach grid, significant lifting of the tail of the f e (  ) tail for both top ICP 100 W and 500 W  T e of tail of distribution is larger at all times.  Ar, 10 mTorr, H = 18.0 cm, R = 0.5 cm, PRF = 10 kHz, DC = 20%.  Grid Spacing: 3.12 mm University of Michigan Institute for Plasma Science & Engr.  Top 100 W  Top 500 W f e (  ) (TOP CW; BOTTOM 100 W, PULSED): H=18 cm ICOPS_2013

18 f e (  ) (TOP 500 W, CW; BOTTOM ICP 100 W, PULSED)  Similar trends in model and experiment. Top ICP has little effect when bottom ICP is on but significant effect in afterglow  Ar, 10 mTorr, H = 10.8 cm, R = 0.5 cm, PRF = 10 kHz, DC = 20%.  Grid Spacing: 3.12 mm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013  Model  Experiment ICP (Bottom) 24  s ICP (Bottom) 98  s ICP (Both) 24  s ICP (Both) 98  s

19 CONCLUDING REMARKS  The use of a remote (top) ICP in tandem with a primary ICP to modify the electron energy distributions in the primary source was investigated.  When both sources have CW power (>90 W) the EEDs are dominated by the local power deposition. Top ICP power has little effect.  The top ICP is able to modify the EEDs in a pulsed afterglow. The tail of the EED is lifted in the afterglow.  The T e of the tail can be larger than the bulk – perhaps due to transport of less collisional, high energy electrons from the top ICP.  These are also the electrons able to overcome the plasma potential of the top ICP and penetrate the grid. University of Michigan Institute for Plasma Science & Engr. ICOPS_2013

20  Grid spacing has negligible effect on plasma parameters.  Grid Spacing: 3.12 mm ; 5.46 mm University of Michigan Institute for Plasma Science & Engr. ICOPS_2013 T e, n e, V P (TOP 500 W, CW; BOTTOM 90 W, CW)

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