Presentation on theme: "ARGUS 54 - Optical Sputter Coater Vacuum Process Technology LLC Dr. Keqi Zhang & Ralph Faber May 1, 2013."— Presentation transcript:
ARGUS 54 - Optical Sputter Coater Vacuum Process Technology LLC Dr. Keqi Zhang & Ralph Faber May 1, 2013
Motivations: Offer a deposition tool for optical coating industry that combines the advantages of both e-beam evaporation (large area, fast rate) and IBS deposition (stable process, higher film quality). Approaches: Plasma enhanced pulsed DC magnetron sputtering Basic concept is based on a 54-inch chamber with a planetary system that contains six 16-inch planets.
Key Performances / Features: Sputtered deposition of multilayers of metals, and metal oxides Large area, fast deposition rate 6 x 16-inch planets Rate: Ta 2 O 5 / Nb 2 O 5 : 5Å/s, SiO 2 : 6Å/s Uniformity: typical ±1.0%, goal: ±0.5% Thickness control Standard: quartz crystal, time power Optional: through-the-planet optical monitoring (Single Wavelength or Broad Band)
Optical Sputter Coater Pulsed DC ion / plasma enhanced Materials: Ta 2 O 5 /SiO 2 Very stable and repeatable process: Deposition rate: 5.0Å/s --- Ta 2 O 5 6.0Å/s --- SiO 2
Current status: Optical properties: excellent Absorption: low Scattering: low Mechanical properties Dense, durable film Film stress: 230 – 300MPa, compressive Film uniformity Less Than ±0.5% on a 16-inch planet High throughput; unparalleled process stability