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Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies Experiments: Progress and Plans Yunping Yang Josh Conway Eli Yablonovitch.

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Presentation on theme: "Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies Experiments: Progress and Plans Yunping Yang Josh Conway Eli Yablonovitch."— Presentation transcript:

1 Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies Experiments: Progress and Plans Yunping Yang Josh Conway Eli Yablonovitch

2 The Problem Classically the resolution limit is determined by the Rayleigh Criterion: Various schemes have been developed to push this to finer resolution than the wavelength itself, but the scale will always be set by wavelength

3 Constant Energy Curves By adiabatically tapering the thin film thickness, very small (<50nm) plasmon wavelengths are attainable for in plane imaging. 1.5 eV 2.0 eV 2.5 eV Plasmon Wavelength in nm Silver Film Thickness in nm Silver Film on Sapphire t p

4 t=1nm t=20nm t=5nm t=2nm Plasmon Wavelength in nm Plasmon Wave-Vector (2  /wavelength in nm) Plasmon Energy in eV h k t=thickness of metal film Optical frequencies, but with X-ray wavelengths! Dispersion Relation: Constant Thickness Curves

5 Grating Coupler Silver Glass Grating Design and fabricate gratings to maximize the coupling efficiency; Verify the DR with constant thickness; Find some material parameters

6 Launching of Surface Plasmons: ATR Coupler

7 Optical Setup for ATR Coupler Laser /2 PBS Beam Expander Iris Mirror Detector Lens 4f Sapphire Hemisphere Ag Thin Film

8 Optical Setup for ATR Coupler Characterize thin film, such as roughness, thickness; Experimentally verify the dispersion relation; Launching a standing wave for Plasmon Wavelength Measurement

9 A Possible Solution This permits X-ray wavelengths at optical frequencies

10 Plasmon Wavelength Measurement Antonello Nesci, Rene Dandliker, Hans Peter Herzig, “Quantitative amplitude and phase measurement by use of a heterodyne scanning near-field optical microscope,” Optics Letters, Volume 26, Issue 4, Resolution: 1.6 nm

11 Taper Motivation dimple lens out-coupling slot far-field from conventional lens taper Taper design will be a trade between absorption (joule heating), scattering (an adiabatic profile), and maintaining a high enough effective index at all points of propagation to maintain features n 9 > n 8 >        >n 1 >n 0

12 Criteria Loss/ Wavelength (nm) It is clear that Loss/ becomes prohibitively large at short wavelengths Thus we change are adiabatic criteria accordingly  / = constant

13 Length (nm) Silver Film Thickness (nm) Taper Profile


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