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Tomsk Polytechnic University Research of Technologies based on Plasma Treatment of Materials in Tomsk Polytechnic University Prof. Valery P. Krivobokov.

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Presentation on theme: "Tomsk Polytechnic University Research of Technologies based on Plasma Treatment of Materials in Tomsk Polytechnic University Prof. Valery P. Krivobokov."— Presentation transcript:

1 Tomsk Polytechnic University Research of Technologies based on Plasma Treatment of Materials in Tomsk Polytechnic University Prof. Valery P. Krivobokov 2A Lenina Avenue, Tomsk, Russia Phone/Fax: Nuclear Physics Institute Faculty of Natural Sciences and Mathematics Department of Hydrogen Energy and Plasma Technologies

2 Report Outline 1.General information. Organization of researches. 2.Solids surface erosion under the action of high-power pulsed beams of charged particles. 3.Plasma sources in diodes of magnetron type. 4. Ion sources with closed drift of electrons. 5.Setups and technologies on plasma coating deposition. 6.Conclusion. Tomsk Polytechnic University 2

3 Place of Nuclear Physics Institute and Hydrogen Energy and Plasma Technologies Department in the Structure of TPU 3 Tomsk Polytechnic University Nuclear Physics Institute Faculty of Natural Sciences and Mathematics Department of Hydrogen Energy and Plasma Technologies Laboratory of Plasma Technologies (#23) Customers Strategic partners SPO PM HCEI Research Institutes Faculties Tomsk Polytechnic University

4 Nuclear Physics Institute Tomsk Polytechnic University 4

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7 Department of Hydrogen Energy and Plasma Technologies Number of employees – 13; Number of students – 60. There are three professors including Professor V. E. Nakoryakov the laureate of Global Energy Prize. Curriculum of Bachelor’s degree Major - Physics Curriculum Master’s degree: 1. Plasma Physics 2. Beam and Plasma Technologies 3. Hydrogen Energy 7

8 The following employees of laboratory #23 of Nuclear Physics Institute and department “Hydrogen Energy and Plasma Technologies” took an active part in this work: 8 Tomsk Polytechnic University O. H. Asainov,D. D. Bainov,G. A. Bleikher, T. V. Butko,A. A. Vaschenko,V. P. Krivobokov, M. N. Mikhailov,T. G. Noskova,O. V. Paschenko, A. G. Puzyrevich,O. M. Stepanova,R. S. Tretiyakov, S. P. Umnov,S. V. Yudakov,Yu. N. Yuriev, A. V. Yurieva,S. N. Yanin

9 - Public corporation “Cathode” (Novosibirsk, Russia); - Plasma Tech. Co, Ltd (Southern Korea); - Preciosa, Ltd (Czech Republic); - ITAC Ltd (Japan); - Sunic Syst. Ltd (Southern Korea); - High-Current Electronics Institute Russian Academy of Sciences (Tomsk); - Scientific Production Organization of applied Mechanics (Krasnoyarsk region, Russia); - Siberian Chemical Plant (Tomsk region, Russia) - Shinco Pantec, Ltd (Japan) and others. 9 Tomsk Polytechnic University Organizations in cooperation with which the researches have been performed:

10 1.Modification of mechanical properties of materials (increase of wear resistance of cutting tools, decrease of friction factor etc.). 2.Improvement of optical properties (reflection, antireflection, low- emission, decorative coatings, production of multi-layer light filters and so on). 3.Increase of surface durability in aggressive and/or high- temperature media (deposition of passive materials on the important details, increase of wear resistance and so on). 4.Creation of conductive coatings (electrodes, microchips, sensor elements, resistance films, signal systems, superconducting coatings etc.). 5.Coatings for medical application (calcium-phosphate layers, tool treatment, medical optics and so on). 6.Technological coatings (production of photomasks, deposition of adhesion layers and others). 7. Plasma chemical processes and so on Tomsk Polytechnic University The most important application areas of material radiation and plasma treatment

11 1) To remove spare atoms from surface (by means of erosion with assistance of high-energy particle beams or plasma chemical cleaning); 2) To apply atoms which will improve the physical properties of material on the surface (by means of formation thin-layer coatings with high functional parameters on the surface). Tomsk Polytechnic University 1 The most critical place of any material or detail is surface. To improve the material properties = to remove defects from surface. There are two main tasks when treating the material surface by plasma or charged particle beams:

12 Surface Sputtering by Accelerated Ions Tomsk Polytechnic University 1212 Dependence of Cu sputtering factor on ion energy [ Yu. A. Ryzhov, I. I. Shkarban. Summary of experimental data on mass-transfer between atomic fluxes and polycrystalline surfaces, Proceedings of Moscow Aviation Institute ] а) b)b) c)c) Schemes of collisions leading to sputtering : а – ricochet sputtering, b – sputtering primary knocked-out atoms response, c –sputtering of atoms as the result of collision cascade

13 Surface sputtering by high-power nanosecond ion beams Tomsk Polytechnic University 1313 t j τ = 100 ns Pulse Beam Permanent Beam i t i + Beam Evaporated Atoms Ion Beam Energy Consumption Zone Evaporated layer

14 Beam parameters: -е -, С +, (Н + + С +), Ar; - pulse duration  =10 -8 …10 -6 s; - Initial energy of particles E = 10 … 1000 keV; - power density P = 10 7 …10 10 W/cm 2 ; - time base of voltage and current density made by experimental data. Target material: Mainly the following metals were used (Cu, Al, Fe, Pb, W and so on). Tomsk Polytechnic University 1414

15 Ion beams Electron beams D= S + Q;D = Q; (at P>10 7 W/cm 2 Q>>S) Here: S – sputtering coefficient conditioned by atom collision processes; Q – component of erosion coefficient induced by evaporation; D – summary coefficient of surface erosion. Tomsk Polytechnic University 1515

16 Equation of continuum: Equation of matter state: Е = Е Х (V) + Е Т (V,T)+ Е е (V,T), Р = Р Х (V) + Р Т (V,T) + Р е (V,T).  Position of boundary between vapor and condensed phases Z: Е T ( ,Т) = L(  ) = L 0 - E X (  ) (для  <  0 ) Erosion coefficient: Tomsk Polytechnic University 1616 Hydrodynamic Model of Evaporation

17 Heat Model for Evaporation Calculation [P < (1..5)·10 9 W/cm 2 ] Equation of thermal conductivity in co-ordinates related to the evaporated surface: Boundary condition on the irradiated surface: Erosion coefficient: Tomsk Polytechnic University 1717

18 Dependence of evaporated quartz layer thickness Z irradiated by mix beam 50%Н+ + 50%С+ с Е=500 keV, τ=150 ns on current density j: 1 – experiment (measurement by profile meter “Tallysurf 5-20” with resolution 0.05 µm); 2 - calculation Tomsk Polytechnic University 1818 Heat model of surface evaporation: comparison of calculations and experimental data

19 Tomsk Polytechnic University 19 Parameters of pulsed beams of charged particles within the range of keV to provide maximal values D Type of Particles Beam parametersD max, atom/particleThickness of evap. layer, µm IonsЕ= keV,  <= 200 ns, P= W/cm ,1..10 Е <100 keV,  <= 200 ns, P= W/cm ElectronsЕ= keV, < 500 ns, P= W/cm 2 ;   < 500 ns, P= W/cm 2 ;, P= W/cm 2   =1..10 µs, P= W/cm Е < 100 keV, < 500 ns, P= W/cm 2  < 500 ns, P= W/cm

20 Plasma Deposition of Coatings Idea of magnetron operation 2020 Tomsk Polytechnic University Processes in diode space Spatial distribution of potential on magnetron diode Anode Substrate Plasma Conditional Anode Spattered Atom Elektron Traectory of Second Electron Target Magnet System Operating Gas Ion

21 Tomsk Polytechnic University Types of magnetrons 2121

22 Tomsk Polytechnic University Planar Magnetron 2

23 Cylindrical Magnetrons Tomsk Polytechnic University 2323

24 Power supply Magnetron Purpose is deposition of dielectric coatings in reactive gas medium Construction of Twin Magnetron: Tomsk Polytechnic University 2424

25 Magnetron with Liquid-Phase Target Tomsk Polytechnic University 2525

26 High-Frequency Magnetron Tomsk Polytechnic University Driving generator ГУ-95 Water F = 13,56 MHz, Р ~ 1-10 kW Main purpose is deposition of coatings made of dielectric targets Magnetron Target Substrate Vacuum chamber 2626

27 NSNS Anode Body Magnetic enhancer Plasma Tomsk Polytechnic University Ion source with closed drift of electrons iii Motion direction of ion beam 2727

28 Tomsk Polytechnic University 28 Ion source with closed drift of electrons Substrate Coating Target Target atom sputtered by ion beam Magnetron with Ion Assistance

29 Tomsk Polytechnic University Setup with magnetron sources of plasma “Yashma” 29

30 Tomsk Polytechnic University Laboratory magnetron setup “Yashma-2” 3030

31 Tomsk Polytechnic University 3131 Intended for glass treating. Maximal size of glass sheets is 1600x2500 mm. Productivity is 15 sq. meters per hour. The Amethist-3 Setup

32 Low-Emission Plasma Coatings on Glass Tomsk Polytechnic University Ni (80%) – Cr (20%) Стеклопакет 20 о С -20 о С Structure of coating SnO 2 Ni (80%) – Cr (20%) Ag SnO 2 Glass 34 nm 2 nm 10 nm 2 nm 34 nm Double-glass unit 3232

33 I II III IV V 1 - sluice; 2 – slit shutter; 3 – reversing chamber; 4 – operation chamber; 5 - zone of glass-holder motion while treating Glass MagnetronIon source Tomsk Polytechnic University Construction of Double-Row Plasma Setups of “Opal”-Series 33

34 Tomsk Polytechnic University 34 The Opal-2 Plasma Setup Intended for Low Emission Coating on glass. Maximal size of glass sheets is 1600x2500 mm. Productivity is 25 sq. meters per hour.

35 Tomsk Polytechnic University sluice; 2 – slit shutter; 3 – reversing chamber I; 4 - operation chamber; 5 – reversing chamber II; 6 – diffusion pump; 7 - electric energy supply; 8 - control board; 9 - working place of operator; 10 – glass after treatment; 11 – glass before treatment; 12 – washing system; 13 - rotation device; 14 - hoisting appliance; 15 - carriage with holders; а) zone of glass preparation; b) zone of plasma treatment а b Technological line on the base of setup “OPAL-3Pro”

36 Томский политехнический университет Tomsk Polytechnic University Setup “Opal-3 PRO” 3636

37 Томский политехнический университет Tomsk Polytechnic University Chambers of velocity smoothing Glass unload Chambers of velocity smoothing Pumping units Ion sources Magnetrons with titanium targets Magnetron with silver target Slit shutter Sluice chamber Glass load Sluice chamber Slit shutter Magnetrons with titanium targets Magnetrons with targets of [Ni (80% - Cr (20%)] This configuration is intended for the deposition of five-layer low-emission coatings of the following type TiO 2 (32 nm) – [Ni (80%) – Cr (20%)](2 nm) – Ag (10 nm) – [Ni (80%) – Cr (20%)] (2 nm) – TiO 2 (32 nm). In case it is necessary to deposit the easier film structures the freed magnetrons can have their targets changed. Construction scheme of setup “Opal-5” (frame details) 3737

38 Томский политехнический университет Tomsk Polytechnic University Technological line basing on “Opal-5” 3838

39 Томский политехнический университет Tomsk Polytechnic University 3939 Плазменные покрытия для защиты искусственных спутников Земли Стекло In 2 O 3 (95%) - SnO 2 (5%) (антистатик) Ag Ni(80%) – Cr (20%) Клеящее вещество Установка АРМ НТП-2

40 Оборудование для учебной лаборатории кафедры ВЭПТ 1. Плазменная установка для нанесения тонких плёнок 2. Плазменная установка с Twin-магнетроном 2

41 Установка для контролируемого нанесения многослойных плазменных покрытий «Яшма-5» 3

42 Автоматизированная установка АРМ УВК для нанесения модифицирующих плазменных покрытий на бортовые элементы космических летательных аппаратов На установке реализованы шесть новых технологий нанесения плазменных покрытий 5

43 Томский политехнический университет Tomsk Polytechnic University 40 Summary: 1. Technologies of material treatment basing on the use of plasma and charged particle beams have good perspectives of practical application in the nearest future. Their market rapidly grows and Tomsk Polytechnic University is an active participant here. 2. We see the development of new technologies, creation of new sources of accelerated ions and plasma fluxes, plasma wider application in hydrogen energy technology as the main perspectives. 3. Team of plasma experts of TPU has intention to continue working in this direction and to unite the experience of other universities especially of Europe for the development of hydrogen energy and plasma technologies.

44 Томский политехнический университет Tomsk Polytechnic University Thank you for attention


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