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Buying a PEALD reactor for TaN deposition for Aalto University Buying a PEALD reactor for TaN deposition for Aalto University 9.3.2010.

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Presentation on theme: "Buying a PEALD reactor for TaN deposition for Aalto University Buying a PEALD reactor for TaN deposition for Aalto University 9.3.2010."— Presentation transcript:

1 Buying a PEALD reactor for TaN deposition for Aalto University Buying a PEALD reactor for TaN deposition for Aalto University

2 Outline TaN Market research Supplier Budget On-site arrangements

3 Steps of the process

4 Tantalum Nitride Applications –Diffusion barrier layers –Gate electrodes –Passivation layers –Protective coatings Deposition (ALD vs. PEALD) –Lower resistivity –Higher density –Higher purity –Safety Properties –Purity –Density –Resistivity –Stability –Adhesion

5 Oxford Instruments Oxford Instruments is a global company operating since 1959 with offices and manufacturing sites in over 25 locations. Oxford Instruments Head Office Tubney Woods, Abingdon, Oxfordshire, OX13 5QX, UK.

6 Picosun Picosun is an international equipment manufacturer with a world-wide sales and service organization. Has continuously designed ALD systems since Headquarter: Picosun Oy Tietotie 3 FI Espoo Finland

7 Beneq Beneq was established in May 2005 Activity is focused on equipment and technology for functional coatings Main office: Beneq Oy P.O. Box 262 FI Vantaa Finland

8

9 Supplier: Beneq Oy Close partnership Long experience with their equipement in our clean room Our old ALDs don’t have a standard PEALD option Easy communication Easy delivery = lower costs

10 Beneq TFS 200 for research Direct and remote PEALD Growth of various films possible Price 303,600 € for TaN growth

11 Budget TFS 200 system for TaN growth: 303,600 € Vacuum pump, other appliances and installation costs: 30 k€ Additional sources: 6900 – € each Operating costs: 20 k€ / year

12 On-site arrangements delivery installation testing trainings TaN processing HAPPY RESEARCHER


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