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ALD thin films for silicon nanophotonics Thin Film Technology Igor Prozheev.

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Presentation on theme: "ALD thin films for silicon nanophotonics Thin Film Technology Igor Prozheev."— Presentation transcript:

1 ALD thin films for silicon nanophotonics Thin Film Technology Igor Prozheev

2 2 Silicon nanophotonics Light behavior on the nano-scale Interaction with nano-particles Silicon as an optical medium Surface plasmons

3 3 ALD thin films characteristics Excellent conformality of high aspect ratio nano- structures. Excellent step coverage uniformity and thickness control over large scale smooth surfaces. Low temperature growth. Minimum damage to substrate materials. Kim et al.,2009

4 4 Applications 1 Sander et al., 2004. 2 Saleem et al., 2012. 3 Huang et al., 2006. 4 Alasaarela et al., 2010. 1 2 3 4

5 5 Nanoplasmonics 1 Im et al., 2012. Jung et al., 1998.

6 6 Conclusion Reduction in propagation losses in Si-slot waveguides Increase in transmission through plasmonic structures due to increase in effective index of the structures. Potential to propagate evanescent modes with relatively longer decay lengths in photonics.

7 7 References Kim,H.,Lee,H.-B.,and Maeng,W.-J.(2009).Applications of atomic layer deposition to nanofabrication and emerging nanodevices. Thin SolidFilms 517, 2563– 2580.doi:10.1016/j.tsf.2008.09.007. Sander,M.,Cote,M.,Gu,W.,Kile,B.,andTripp,C.(2004).Teplate-assisted fabrication of dense,aligned arrays of titania nanotubes with well-controlled dimensions on substrates. Adv.Mater. 16, 2052–2057.doi:10.1002/adma.200400446. Saleem,M.R.(2012). Resonant Waveguide Gratings by Replication and Atomic Layer Deposition. Ph.D.,thesis,DepartmentofPhysicsandMathematics,Universityof EasternFinland,Joensuu. Huang,J.,Wang,X.,andWang,Z.L.(2006).Controlled replication of butterfly wings for achieving tunable photonic properties. NanoLett. 6, 2325–2331. doi:10.1021/nl061851t. Alasaarela,T.,Saastamoinen,T.,Hiltunen,J.,Aaynatjoki,A.,Tervonen,A.,Stenberg, P.,et al.(2010).Atomic layer deposited titanium dio xide and its application in resonant waveguide grating. Appl.Opt. 49, 4321–4325.doi:10.1364/AO.49. 004321. Im,H.,Wittenberg,N.J.,Lindquist,N.C.,andOh,S.-H.(2012).Atomic layer deposition: a versatile technique for plasmonics and nanobiotechnology. J.Mater.Res. 27, 663– 671.doi:10.1557/jmr.2011.434. Jung,L.S.,Campbell,C.T.,Chinowsky,T.M.,Mar,M.N.,andYee,S.S.(1998). Quantitative interpretation of the response of surface plasmon resonance sensors to adsorbed films. Langmuir 14, 5636–5648.doi:10.1021/la971228b.

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