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MPA 2010, Braga HIGH VACUUM PLANTS FOR REACTIVE SPUTTER DEPOSITION OF MULTI-LAYER STACKS Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria.

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Presentation on theme: "MPA 2010, Braga HIGH VACUUM PLANTS FOR REACTIVE SPUTTER DEPOSITION OF MULTI-LAYER STACKS Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria."— Presentation transcript:

1 MPA 2010, Braga HIGH VACUUM PLANTS FOR REACTIVE SPUTTER DEPOSITION OF MULTI-LAYER STACKS Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria

2 PURPOSE  Presentation of developed high vacuum systems for reactive sputter deposition of multi-layer stacks with special attention to growth of decorative and optical thin films.  Introduction of the future trends of our activity in this field.  Establishment of new contacts with respect to be involved in new projects in the field. MPA 2010, Braga

3 MPA 2010, BragaOUTLINE  Introduction  HV System for reactive sputter deposition of decorative coatings onto plastics parts:  Pumping unit based on oil diffusion pumps with LN2 baffles;  Planetary mechanism with two stages of freedom; 3D deposition;  Two 24” rectangular unbalanced cathodes arranged in closed-field UBMSS and MF pulsed magnetron power supplies – our new concept;  Gas injection of Ar and O2.  HV System for reactive sputter deposition of multi-layer optical stacks:  Pumping unit based on turbomolecular pump;  Planetary mechanism with two stages of freedom and substrate tilting;  Four 3” circular unbalanced cathodes and MF pulsed power supplies;  Gas injection of Ar and O2.  Complete process automation and monitoring, based on PLC / PC, remote control through SCADA interface.  Conclusion

4 MPA 2010, Braga INTRODUCTION  Automatic Leak Valve ALV 01 and vacuum gauges.  Highly Unbalanced Planar Magnetron Cathodes, arranged in CFUBMSS.  MF pulsed DC magnetron power supplies – our new concept.  Automation based on the Mitsubishi FX1N PLC.  Remote control through SCADA interface.  Applicable technology:  Reactive sputter deposition of various compound thin films;  Constant Partial Pressure and Plasma Impedance Control modes;  Deposition of multi-layer decorative and optical stacks;  Alumina deposition.  Complete solutions.

5 MPA 2010, Braga HV System for deposition of decorative coatings 1  SYSTEM DESCRIPTION: Horizontal cylindrical working chamber, pumping unit based on two oil diffusion pumps with LN 2 baffles, ROOTS and rotary vane pumps, planetary mechanism with fast change of the substrates, two 24” rectangular planar highly unba- lanced cathodes for flange mounting, two MF pulsed magnetron power supplies, measurement and control subsystem, consisting of Pirani Vacuum Gauge PRVG 02, Penning Vacuum Gauge PNVG 01, two Automatic Leak Valves ALV 01, switching unit, Mitsubishi FX1N PLC and PC, cooling water subsystem and compressed air subsystem.  Designed and manufactured in partnership with SATEL BG Ltd.  AWERAGE POWER CONSUMPTION – 16 kW/h.  COOLING WATER CONSUMPTION – 1 cub.m/h.  LN 2 CONSUMPTION – 4 l/h.  CAPACITY – 10 million details monthly.  MAINTENANCE PERSONNEL – one person.

6 HV System for deposition of decorative coatings 2  Highly Unbalanced magnetron cathodes:  Target dimensions 610 x 102 x 12 mm (24”x 4”x ½”);  Target clamping, indirect target cooling;  Magnet array over-sized and movable for improved target utilization up to 40%; Low Ar working pressure, such as 9.0 E-4 mbar is provided;  No water-to-vacuum seals;  For flange mounting through wall opening;  Closed Field Unbalanced Magnetron Sputter System arrangement. MPA 2010, Braga

7 HV System for deposition of decorative coatings 3  Working chamber:  Horizontal cylindrical chamber Ф 1000 x L 750 mm;  Planetary mechanism with two stages of freedom and fast change of the substrate holders;  Gas injection of both Ar and O 2 working gases.

8 MPA 2010, Braga HV System for deposition of decorative coatings 4  Deposited layer stacks  Gold-like four layer stack, based on brass sputtering; Top oxide layer for corrosion protection and colour tuning;  Silver-like two-layer stack, based on Al sputtering; Alumina deposition for corrosion and scratch resistance;  Titanium and Chromium single layers, TiN coating;  No base or top varnishing.

9 MPA 2010, Braga HV System for deposition of optical coatings 1  SYSTEM DESCRIPTION: Vertical cylindrical working chamber with top cover lifting, pumping unit based on Turbovac 600C and rotary vane pump with LN 2 baffle, planetary mechanism with two stages of freedom and substrates tilting, four 3” circular planar highly unbalan- ced cathodes for flange mounting arranged in CFUBMSS, four 1kW MF pulsed magnetron power supplies MPS 10F, measurement and control subsystem, consisting of Pirani Vacuum Gauge PRVG 02, Penning Vacuum Gauge PNVG 01, two Automatic Leak Valves ALV 01, switching unit, Mitsubishi FX1N PLC - PC and cooling water subsystem.  AWERAGE POWER CONSUMPTION – 2,5 kW/h.  COOLING WATER CONSUMPTION – 100 l/h.  LN 2 CONSUMPTION – 1 l/h.  CAPACITY – 5 sq. dm. per batch, average batch duration – 45 min.  MAINTENANCE PERSONNEL – one person.

10 MPA 2010, Braga HV System for deposition of optical coatings 2  Highly Unbalanced circular magnetron cathodes:  Target dimensions Ф 76,2 x 3,2 mm (Ф 3”x 1/8”);  Target clamping, indirect target cooling;  Movable magnet array for improved target utilization up to 40%; Low Ar working pressure, such as 9.0 E-4 mbar is provided;  No water-to-vacuum seals;  For flange mounting through wall opening;  Closed Field Unbalanced Magnetron Sputter System arrangement.  Target materials:  Chromium;  Aluminium;  Silver;  Titanium;  Silicon;  Copper;  Stainless Steel.

11 MPA 2010, Braga HV System for deposition of optical coatings 2  Highly Unbalanced circular magnetron cathodes:  Target dimensions Ф 76,2 x 3,2 mm (Ф 3”x 1/8”);  Target clamping, indirect target cooling;  Movable magnet array for improved target utilization up to 40%; Low Ar working pressure, such as 9.0 E-4 mbar is provided;  No water-to-vacuum seals;  For flange mounting through wall opening;  Closed Field Unbalanced Magnetron Sputter System arrangement.  Target materials:  Chromium;  Aluminium;  Silver;  Titanium;  Silicon;  Copper;  Stainless Steel.

12 MPA 2010, Braga HV System for deposition of optical coatings 3  Working chamber:  Vertical cylindrical chamber Ф 320 x H 185 mm;  Top cover lifting for better access to the working chamber;  Planetary mechanism with two stages of freedom and substrate holders tilting for better thickness uniformity; Fast change of holders;  Gas injection of both Ar and O2 working gases.

13 HV System for deposition of optical coatings 4 MPA 2010, Braga  Applied Technology  Sputter deposition of pure metals, gradient composition layers;  Reactive sputter deposition – constant partial pressure deposition;  Reactive sputter deposition – Plasma Impedance control mode.  Deposited reflective layer stacks – front mirrors:  Protected Al mirror (Cr + Al + SiO 2 );  Enhanced Al mirror (Cr + Al + SiO 2 + TiO 2 + SiO 2 );  Protected Silver mirror (Cr + Ag + SiO 2 ).  Deposited reflective layer stacks – back mirrors:  Ag + Cu + Cr;  Al + Cr;

14 MPA 2010, Braga Process Automation and SCADA Interface  Process Automation  Mitsubishi FX1N PLC based; Pumping and deposition in one program is provided. It ensures process stability and reproducibility.  SCADA Interface:  Process steps visualization and data acquisition; Database processing;  Easy recipes creating, memorizing and change; Deposition finishing after electricity interruption during deposition is provided;  Remote control by Remote Desktop through the Net is provided.

15 MPA 2010, Braga CONCLUSIONS  Complete solutions  Rugged and reliable equipment  Customer specified deposition processes  Co-operation ACKNOWLEDGEMENTS


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