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2015-01-15 1 Diffractive Optical Element Design Tools and Fabrication Process Kyunghwan Oh, Department of Physics Yonsei University.

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Presentation on theme: "2015-01-15 1 Diffractive Optical Element Design Tools and Fabrication Process Kyunghwan Oh, Department of Physics Yonsei University."— Presentation transcript:

1 2015-01-15 1 Diffractive Optical Element Design Tools and Fabrication Process Kyunghwan Oh, Department of Physics Yonsei University

2 2015-01-15 2 Contents 1.Available DOE design CAD - DECAD - DOE-CAD-W - DiffacMOD - Optis - VirtualLab 2. DOE Fabrication Process - Jena Photonics Fabrication Network (JPFN) - Institute of Applied Physics, Fredrich Schiller U.

3 2015-01-15 3 Available DOE design CAD - DECAD - DOE-CAD-W - DiffacMOD - Optis - VirtualLab More than 6 commercially available CADs Probably VirtualLab might be the most recent and and most efficient one.

4 2015-01-15 4 Available DOE design CAD DECAD http://diffractive.optics.free.fr/ Free Download Latest Version 2.44, May 30 2005 Linux OS Used by Samsung, Sony, Toshiba Chalmers University e-beam writter file format only. Other output file formats will be added “DECAD ( Diffractive Element Computer Assisted Design ) is a powerful and versatile software developed by Dr. Olivier MAGNIN for diffractive optics design. DECAD both allows synthesis of diffracting phase functions and accurate simulation of their performances. The simulation engine relies on various selectable propagators (Angular Spectrum, Rayleigh-Sommerfeld, Kirchhoff,... ) that are used by the designer for in-depth analysis of the light diffracted by the DOE aperture.”

5 2015-01-15 5 Available DOE design CAD DECAD Gaussian to Flat-Top Analytic Phase Function

6 2015-01-15 6 Available DOE design CAD DECAD

7 2015-01-15 7 Available DOE design CAD DECAD Simulation of Diffraction including High Orders Investigation of Fabrication Tolerance

8 2015-01-15 8 Available DOE design CAD DECAD Master fabricated by e-beam lithography

9 2015-01-15 9 Available DOE design CAD DECAD Experimental Assessment

10 2015-01-15 10 Available DOE design CAD DOE-CAD-W http://www.holoor.co.il HOLO/OR makes DOE as well as DOE-CAD-W MS-Window based One of earliest pioneer Compatible to Optics Tool, Zemax, Oslo, CodeV, along with various outputs “DOE-CAD for windows, masks generation and performance modeling, for diffractive optical elements DOE-CAD-W is a software package designed to transform phase function specified by user into the set of mask files for generating multi-level or gray level DOEs.”

11 2015-01-15 11 Available DOE design CAD DOE-CAD-W

12 2015-01-15 12 Functions available in DOE-CAD-W Mask files in industrial formats: GDS-II, PostScript, Linework, Bitmap Mask preview with zoom and cursor Multiplication of DOE into array of elements with 100% full field factor Generation of off-center part of the DOE-mask. Numerical simulation of focal intensity distribution Estimation of efficiency, accuracy of DOE performance Available DOE design CAD DOE-CAD-W

13 2015-01-15 13 Functional advantages · 2-D nonsymmetrical DOEs supported · Computer simulation of DOE performance · Simulation pictures in standard TIFF image format Production management advantages · Mask files placed at any directory on hard disk · Production management support: printing of production form with overview of all DOE specification, with date, serial number, model, quantity etc. · Inventory of DOE masks inputs. Available DOE design CAD DOE-CAD-W

14 2015-01-15 14 DiffacMOD Available DOE design CAD http://www.rsoftdesign.com/ A module of Optical Simulation Package, Rsoft Passive Device Suite DiffractMOD™ is a general design and simulation tool for diffractive optical structures such as diffractive optical elements, subwavelength periodic structures, and photonic bandgap crystals. It is based on the Rigorous Coupled Wave Analysis (RCWA) technique which has been implemented using advanced algorithms including fast Fourier factorization and generalized transmission line formulation. Already a market leader, the tool has extensive applications in a broad range of areas including semiconductor manufacturing and wave optics.

15 2015-01-15 15 DiffacMOD Available DOE design CAD

16 2015-01-15 16 http://www.optis-world.com/ LSP lab from the University of Strasbourg, France, Gerchberg-Saxton algorithm. Bitmap Image input/output demo evaluation version or quotation : does@optis-world.com Optis Available DOE design CAD “There are a lot of DOE simulation tools, but every feature developed in DOEs simulation tool as been though with tolerancing issues in mind. As a consequence, the final purpose of DOEs simulation tool is to allow every even unskilled user to see the evolution of the reconstructed image quality when changing source or DOE parameters.”

17 2015-01-15 17 Step 1 : just define you laser beam Step 2 : define your target with a BMP editor software Step 3 : choose DOE parameters you want to build : sampling, number of phase level, near field or far field optimization Step 4 : just press « Start » to see the evolution of your result during the optimization. It will automatically stop when finished Step 5 : here is your result : you can see quality, uniformity of the generated DOE, and you obtain a file that represents it: each pixel value (gray level) corresponds to a phase level. This result can be exported as a bitmap or a formatted text file for industrial manufacturing. Optis Available DOE design CAD

18 2015-01-15 18 Optis Available DOE design CAD

19 2015-01-15 19 VirtualLab Available DOE design CAD http://www.lighttrans.comhttp://www.lighttrans.com Jena, Germany Version 3.0 October 11 2006 General Optical Simulation CAD including DOE Institute of Applied Physics, Fredrich Schiller University Fraunhofer Institute of Applied Optics Fabrication service available by Jena Photonics Fabrication Network™

20 2015-01-15 20 VirtualLab™ - Your Benefit The electromagnetic field kernel and the generalized spread sheet concept Flexopas™ constitute the fundament of VirtualLab™. Your most essential benefits can be stated in: Light Source Models Definition of System Quality Measures Adjustment of Field Propagation Techniques Rapid System Investigation Wave-Optical Design VirtualLab Available DOE design CAD

21 2015-01-15 21

22 2015-01-15 22 VirtualLab Available DOE design CAD Two Movies for DOE Design

23 2015-01-15 23 DOE Fabrication Process

24 2015-01-15 24 DOE Fabrication Process

25 2015-01-15 25 DOE Fabrication Process

26 2015-01-15 26 DOE Fabrication Process

27 2015-01-15 27 DOE Fabrication Process

28 2015-01-15 28 DOE Fabrication Process

29 2015-01-15 29 DOE Fabrication Process

30 2015-01-15 30 DOE Fabrication Process

31 2015-01-15 31 DOE Fabrication Process

32 2015-01-15 32 DOE Fabrication Process

33 2015-01-15 33 DOE Fabrication Process

34 2015-01-15 34 DOE Fabrication Process

35 2015-01-15 35 DOE Fabrication Process

36 2015-01-15 36 DOE Fabrication Process

37 2015-01-15 37 DOE Fabrication Process

38 2015-01-15 38 Hot Embossing Microfabrication Hot Embossing is a technique of imprinting microstructures on a substrate (polymer) using a master mold (silicon tool).

39 2015-01-15 39 Steps in Hot Embossing Heating Silicon & Polymer above glass transition temperature (T g ). Applying load by pressing the silicon tool on polymer at certain embossing pressure. Cooling the silicon tool and polymer assembly below T g and de-embossing the tool. Master/Mold from Femto- Second Laser Heat the substrate and mold to just above T g of the substrate Apply embossing force on the substrate via the mold under vacuum Cool the substrate and mold to just below T g De-embossing of the mold and substrate

40 2015-01-15 40 Advantages of Hot Embossing System Cost effective – Easy manufacturability. Time efficient – Fast process. Fabrication of high aspect ratio features. Bio-Compatible surfaces – Polymer substrates used. Disposable – Low cost for volume production.

41 2015-01-15 41 Applications of Hot Embossing BioMEMS/Bio-Sensors Micro-Fluidic Devices Micro-Optics  -TAS (Micro Total Analysis Systems)

42 2015-01-15 42 Hot Embossing v/s Other MEMS Fabrication Processes CharacteristicsLIGASurface Micro- machining Hot Embossing Number of layers13-51 Minimum feature size5 microns 1 micron Aspect ratio20N/A10 CostHighModerateLow ProductivityModerateLowHigh Residual StressVery LowHighLow

43 2015-01-15 43 Schematic Representation of Hot Embossing Setup

44 2015-01-15 44 Hot Embossing Conceptual Solid Models

45 2015-01-15 45 Mini-Vacuum Chamber Mini vacuum chamber used to provide a clean and moisture free environment during embossing. Mini vacuum chamber can accommodate an 8” substrate.

46 2015-01-15 46


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