Quang ph Laser MC ĐÍCH: Nghiên cu s nh hưng ca t l dòng oxy đưa vào trong h phún x trong vic ch to màng Nghiên cu s nh hưng ca nhit đ trong quá trình hình thành cu trúc ca màng
Quang ph Laser GiI THIU: Ch to màng TiOx bng phương pháp phún x magneton trc tip nhit đ phòng vi t l dòng oxy đưa vào khong 3-15% Sau đó đem nhit 350-750 o C Dùng ph nhiu x tia X, quang phát quang và ph Raman đ nghiên cu tính cht ca màng
Quang ph Laser THÍ NGHIM: Dùng đ p-Si(100), làm sch bi H 2 SO 4 và H 2 O Target Ti tinh khit 99.99%, đưng kính 2in và đưc áp vào ngun DC 100W Đ đưc áp đin th -150V Khong cách gia đ và bia là 100mm Áp sut nn 2.7*10-4 Pa, Áp sut làm vic 2.7*10-4 Pa Thi gian phún x 40 phút Đ dày ca màng t 50-200nm
Quang ph Laser Cu trúc màng, thông tin phase (anatase hay rutile) đo bi quang ph k tia X s dng bc x Cu Kα (0.1542nm). Made in Japan Các liên kt đưc đo bi ph Raman. Made in France Ph PL dùng laser He-Cd 325nm 50mW, cách t và CCD ĐO TÍNH CHT MÀNG:
Quang ph Lazer LabRAM HR UV/Vis/NIR + Ar ion CW Laser (514.5nm, 488nm) upto 40mW at sample. + He-Cd CW Laser (325nm) -Auto motor controlled XY mapping stage AnataseRutile
Quang ph Laser Anatase APPLICATION 1- Paints, and Coating, emulsion interior Paints, Enamels 2- Road-Marking Paints 3- Filler, Primers, and undercoat 4- Paper Industry 5- Plastic Industry 6- Rubber Industry 7- Cement Industry. widely used in painting, printing oil paper making Plastic Rubber artificial fiber (si quang nhân to) welding electric (hàn đin) Enamel (tráng men) electric appliances and construction material etc Rutile
GIXRD patterns of titanium oxide lms formed at: 3, 6, 10 and 15 FO2% and post-annealing at 750 °C for 2 min in air RESULTS AND DISCUSSION _ The deposition time was xed at 40 min. _ The crystalline (101) anatase peak denoted as A(101) at 25,3°. _ The (110) rutile peak denoted as R(110) at 27.4° can be easily observed from the TiOx thin lm formed at 3 FO2%. _ The intensity of anatase peaks at 3 FO2% is stronger than rutile peaks. _ As FO2% is higher than 6%, the rutile peaks cannot be detected.
GIXRD patterns of titanium oxide lms formed at: 3 FO2% and post-annealed at RT, 350°C, 550°C, and 750°C for 2 min in air. RESULTS AND DISCUSSION _ TiO x lm annealed at 350°C is still an amorphous lm because of no distinct diffraction peak. _ The mixed crystalline anatase and rutile lms are obtained after 550°C and 750°C annealing. _ The intensity of both anatase and rutile peaks increases with increasing temperature.
Raman spectra of titanium oxide lms formed at 3, 6, 10 and 15 FO2% and post-annealed at 750 °C for 2 min in air. RESULTS AND DISCUSSION _ The lm at 3 FO2% shows several anatase peaks at 396 and 639 cm 1 and rutile peaks at 449 and 612 cm 1. _ The rutile peaks decrease with increasing oxygen ow ratio. _ The intensity of anatase peak decreaseswith increasing oxygen ow ratio due to the reduction of lm thickness.
Raman spectra of titaniumoxide lms at 3 FO2% and post- annealed at RT, 350 °C, 550 °C, and 750 °C for 2 min in air. RESULTS AND DISCUSSION _ The intensity of anatase peaks at 396 and 639 cm 1 and rutile peaks at 449 and 612cm 1 increases with annealing temperature from RT to 750°C, especially for anatase peaks.
PL spectra of titanium oxide lms formed at 3, 6, 10 and 15 FO2% and post-annealed at 750 °C for 2 min in air. RESULTS AND DISCUSSION The relationship between the crystalline structure and PL behaviors of titanium oxides Laser excitation: 325 nm, at the room temperature _ The weak shoulder peak at 650 nm is induced from the laser source. _ An asymmetrical wide FWHM peak in visible region is observed at the 3 FO2% sample.
The Gaussian tted curve of PL spectra of the 3 FO2% lm at 750 °C annealed for 2 min in air. RESULTS AND DISCUSSION _ The wide peak is merged from two different TiO x peaks. _ The curve can be tted into two Gaussian peaks at 486 nm (2,55eV) and 588 nm(2,11eV).
PL spectra of titanium oxide lms at 3 FO2% and post-annealed at RT, 350 °C, 550 °C, and 750 °C for 2 min in air. RESULTS AND DISCUSSION _ Luminescence shift caused by the mixed anatase and rutile phase. _ The intensity of PL peaks increases with annealing temperature because of enhancement of the crystalline phase. _ For the as-deposited and 350 °C annealed samples, the PL signal is very weak due to the poor crystallinity.
The oxygen ow ratios during deposition and post-annealed temperatures result in the evolution of phase formation of the lms CONCLUSION The XRD and Raman results indicate that the 3 FO2% lm is formed of a mixed phase of anatase and rutile, and the specimens of 10 FO2%, and 15 FO2% are the single-phase anatase after 550–750 °C annealing The as-deposited TiOx lms and those annealed at 350 °C are all amorphous because of no distinct diffraction peak. The minimum thermal annealing temperature necessary to stimulate the crystallization of lm is between 350 °C and 550°C.
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