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NANOHARD 2007 MF pulsed DC power supplies for PVD processes Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria www.mac-co.dir.bg.

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Presentation on theme: "NANOHARD 2007 MF pulsed DC power supplies for PVD processes Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria www.mac-co.dir.bg."— Presentation transcript:

1 NANOHARD 2007 MF pulsed DC power supplies for PVD processes Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria

2 PURPOSE  Presentation of developed MF pulsed DC power supplies for reactive film deposition with special attention to reactive magnetron sputtering and substrate biasing.  Target poisoning and arc management. How to increase ionization and simultaneously to decrease arc formation probability.  Introduction of our new equipment for deposition of a-C coatings onto cardiovascular stents.  Introduction of our asymmetric bipolar MF pulsed DC technology and power supplies.  Establishment of new contacts with respect to be involved in new projects in the field. NANOHARD 2007

3 NANOHARD 2007 OUTLINE  Introduction  Reactive Sputter Deposition – target poisoning and arc formation. MF pulsed DC power supplies.  Target poisoning, reasons and how to prevent it;  Arc suppression, “Soft arc handling” mode;  MF pulsed magnetron power supplies – variety of models;  Amorphous Diamond sputter deposition equipment.  Substrate biasing:  Unipolar pulsed bias power supplies - applications;  Our own asymmetric bipolar technology;  Asymmetric bipolar MF pulsed DC bias power supply;  Future trends – bipolar pulsed magnetron PS.  Conclusion

4 NANOHARD INTRODUCTION  Reactive Sputter Deposition of insulating layers.  Target poisoning and arc formation.  Bipolar MF pulsed DC power supplies  Unipolar MF pulsed DC power supplies

5 NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 1  Target poisoning and how to prevent it – complete solution.  MF pulsed magnetron power supplies – best choice:  Fast Arc suppression, Soft Arc Handling mode;  Straight DC and unipolar MF pulsed modes of operation;  Frequency range 50 to 150 kHz, duty cycle range 0,2 to 0,75;  Pulsed power supplies working in pulsed mode only at fixed 60 kHz frequency.

6 NANOHARD REACTIVE SPUTTER DEPOSITION 2  New voltage waveform concept for higher ionization and lower arc formation probability.  Suitable for industrial scale sputter deposition of highly insulating layers, such as Al 2 O 3 and AlN.  10 kW MF pulsed magnetron power supplies, working at fixed 50 kHz. Soft Arc Handling capability. Voltage waveform Current waveform

7 NANOHARD REACTIVE SPUTTER DEPOSITION 3  Amorphous Diamond Sputter Deposition  Circular cathodes for flange mounting. Two Cathodes’ Closed Field Unbalanced Magnetron Sputter System.  Unipolar pulsed magnetron power supply, working at fixed 60 kHz; High voltage pulses for high ionization probability.  Multi - layer coatings, based on Ti and Carbon, reactively sputtered in N 2 atmosphere. Pulsed substrate biasing.

8 NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 4  Cardiovascular stents with biocompatible Carbon based coatings.  Three – dimensional deposition conditions.  Ti ion etching and base coating prior to deposition of Carbon – based coating. Multi – layer design.  Both a-C and C 3 N 4 biocompatible top layer possibility.  Unipolar pulsed substrate biasing both during ion etching and sputter deposition.

9 NANOHARD ASYMMETRIC BIBOLAR PULSED TECHNOLOGY  OUR OWN ASYMMETRIC BIPOLAR PULSED TECHNOLOGY  Negative pulse amplitude adjustment in the range –20 to –200V;  Positive pulse amplitude depends on the output current magnitude and is in the range +15 to +50V;  Duty cycle adjustment in the range 0,12 to 0,42;  Negative pulse current limiting along with acting as a voltage source during the positive pulse.

10 NANOHARD ASYMMETRIC BIBOLAR PULSED TECHNOLOGY FUTURE TRENDS  Asymmetric bipolar MF pulsed DC magnetron power supply design – both working at fixed 60 kHz or in the frequency range 50 to 100 kHz.  Magnetron power supply, supporting straight DC, unipolar and asymmetric bipolar pulsed modes, 1kW output power for lab applications.  Fast arc suppression, switching – off time as short as 600 ns, Soft Arc Handling mode.

11 NANOHARD CONCLUSION  Complete solutions  Rugged and reliable equipment  Customer specified pulsed power supplies  Best “performance to cost” ratio  Trusted and reliable delivery all over the world  Co-operation


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