Presentation on theme: "NANOHARD 2007 MF pulsed DC power supplies for PVD processes Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria www.mac-co.dir.bg."— Presentation transcript:
NANOHARD 2007 MF pulsed DC power supplies for PVD processes Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria www.mac-co.dir.bg
PURPOSE Presentation of developed MF pulsed DC power supplies for reactive film deposition with special attention to reactive magnetron sputtering and substrate biasing. Target poisoning and arc management. How to increase ionization and simultaneously to decrease arc formation probability. Introduction of our new equipment for deposition of a-C coatings onto cardiovascular stents. Introduction of our asymmetric bipolar MF pulsed DC technology and power supplies. Establishment of new contacts with respect to be involved in new projects in the field. NANOHARD 2007 www.mac-co.dir.bg
NANOHARD 2007 OUTLINE Introduction Reactive Sputter Deposition – target poisoning and arc formation. MF pulsed DC power supplies. Target poisoning, reasons and how to prevent it; Arc suppression, “Soft arc handling” mode; MF pulsed magnetron power supplies – variety of models; Amorphous Diamond sputter deposition equipment. Substrate biasing: Unipolar pulsed bias power supplies - applications; Our own asymmetric bipolar technology; Asymmetric bipolar MF pulsed DC bias power supply; Future trends – bipolar pulsed magnetron PS. Conclusion www.mac-co.dir.bg
NANOHARD 2007 www.mac-co.dir.bg INTRODUCTION Reactive Sputter Deposition of insulating layers. Target poisoning and arc formation. Bipolar MF pulsed DC power supplies Unipolar MF pulsed DC power supplies
www.mac-co.dir.bg NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 1 Target poisoning and how to prevent it – complete solution. MF pulsed magnetron power supplies – best choice: Fast Arc suppression, Soft Arc Handling mode; Straight DC and unipolar MF pulsed modes of operation; Frequency range 50 to 150 kHz, duty cycle range 0,2 to 0,75; Pulsed power supplies working in pulsed mode only at fixed 60 kHz frequency.
NANOHARD 2007 www.mac-co.dir.bg REACTIVE SPUTTER DEPOSITION 2 New voltage waveform concept for higher ionization and lower arc formation probability. Suitable for industrial scale sputter deposition of highly insulating layers, such as Al 2 O 3 and AlN. 10 kW MF pulsed magnetron power supplies, working at fixed 50 kHz. Soft Arc Handling capability. Voltage waveform Current waveform
NANOHARD 2007 www.mac-co.dir.bg REACTIVE SPUTTER DEPOSITION 3 Amorphous Diamond Sputter Deposition Circular cathodes for flange mounting. Two Cathodes’ Closed Field Unbalanced Magnetron Sputter System. Unipolar pulsed magnetron power supply, working at fixed 60 kHz; High voltage pulses for high ionization probability. Multi - layer coatings, based on Ti and Carbon, reactively sputtered in N 2 atmosphere. Pulsed substrate biasing.
NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 4 www.mac-co.dir.bg Cardiovascular stents with biocompatible Carbon based coatings. Three – dimensional deposition conditions. Ti ion etching and base coating prior to deposition of Carbon – based coating. Multi – layer design. Both a-C and C 3 N 4 biocompatible top layer possibility. Unipolar pulsed substrate biasing both during ion etching and sputter deposition.
NANOHARD 2007 www.mac-co.dir.bg ASYMMETRIC BIBOLAR PULSED TECHNOLOGY OUR OWN ASYMMETRIC BIPOLAR PULSED TECHNOLOGY Negative pulse amplitude adjustment in the range –20 to –200V; Positive pulse amplitude depends on the output current magnitude and is in the range +15 to +50V; Duty cycle adjustment in the range 0,12 to 0,42; Negative pulse current limiting along with acting as a voltage source during the positive pulse.
NANOHARD 2007 www.mac-co.dir.bg ASYMMETRIC BIBOLAR PULSED TECHNOLOGY FUTURE TRENDS Asymmetric bipolar MF pulsed DC magnetron power supply design – both working at fixed 60 kHz or in the frequency range 50 to 100 kHz. Magnetron power supply, supporting straight DC, unipolar and asymmetric bipolar pulsed modes, 1kW output power for lab applications. Fast arc suppression, switching – off time as short as 600 ns, Soft Arc Handling mode.
NANOHARD 2007 www.mac-co.dir.bg CONCLUSION Complete solutions Rugged and reliable equipment Customer specified pulsed power supplies Best “performance to cost” ratio Trusted and reliable delivery all over the world Co-operation