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Thin Film Coatings for SPS-U November 20, 2007 Progress report Paolo Chiggiato in behalf of TS-MME-CCS.

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Presentation on theme: "Thin Film Coatings for SPS-U November 20, 2007 Progress report Paolo Chiggiato in behalf of TS-MME-CCS."— Presentation transcript:

1 Thin Film Coatings for SPS-U November 20, 2007 Progress report Paolo Chiggiato in behalf of TS-MME-CCS

2 Nitrides and carbides of elements of the 4 th group Already used for accelerators Carbon based materials: graphite, amorphous, N added sp2 hybridized amorphous carbon have extraordinarily low SEY, while sp3 hybridized carbon has a high SEY. Amorphous carbon nitride is an interesting coating for multipacting suppression because nitrogen inhibits sp3 hybridization of carbon atoms. J. Appl. Phys., Vol. 92, No. 1, 1 July 2002 Main objectives: - Test both (roughly optimized) materials in the SPS in March 08; -Availability of a combined XPS-SEY system by March 08 -Apply the selected coating techniques to SPS chambers

3 First objective: test both mat. in the SPS in March 08 Nitrides sputtering system: - cathode design; - installation of the sputtering system in b. 181; - Ti deposition: thickness profile; - TiN deposition: preliminary plasma stability tests; - TiN samples of different compositions. forthcoming Carbon sputtering system: - cathode available (large furnace heating element); - installation of the sputtering system in b. 181; - C deposition in tubular chambers ( =10 cm) - C:N deposition in tubular chambers (F=10 cm) - C:N optimization of parameters forthcoming

4 First objective: test both mat. in the SPS in March 08 Structural & Metallurgical: - surface morphology (SEM); - thickness measurements (SEM); - structure assessment by X-ray diffraction; - composition by GDOS; - surface composition by XPS.vs. heating T - nanohardness; - adherence tests, thermal cycling; - TiN samples of different compositions. UHV compatibility: - pumpdown characteristic (porosity); - outgassing rates before and after baking; - thermal desorption; - ESD following baking at different T; - PSD at ESRF; Imminent for C and C:N Sample characterization protocol

5 Second objective: availability of a combined XPS-SEY in March Components availability: - electron gun: order sent; - sample manipulators: imminent order; - vacuum chamber design: ready; - vacuum chamber production: started; - pumping system: defined. Manpower: - PhD student fees maybe shared; - Luigi Leggiero: chamber construction; - Holger Neupert: SEY system installation; - Ivo Wevers: vacuum;

6 Third objective: coating feasibility in the SPS - considering horizontal coating in the experimental areas; - vertical configuration realistic ? - a brainstorming is unavoidable…


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