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Time-dependent hydrogen annealing of Mg-doped GaN Ustun R. Sunay J. Dashdorj M. E. Zvanut This work is funded the National Science Foundation, Grant No.

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Presentation on theme: "Time-dependent hydrogen annealing of Mg-doped GaN Ustun R. Sunay J. Dashdorj M. E. Zvanut This work is funded the National Science Foundation, Grant No."— Presentation transcript:

1 Time-dependent hydrogen annealing of Mg-doped GaN Ustun R. Sunay J. Dashdorj M. E. Zvanut This work is funded the National Science Foundation, Grant No. DMR 1006163.

2 Outline Motivation –What can GaN do for us? Background –What do we need to know about Mg-doped GaN? –Explain electron paramagnetic resonance (EPR) Experiment –What are the parameters of our experiment? Results –EPR spectra Summary - Alloying GaN with aluminum changes the kinematics of hydrogen passivation.

3 Why Care About GaN? http://en.wikipedia.org/wiki/File:RBG-LED.jpg Why Care About GaN? Other list of Applications High frequency devices High electron mobility transistors- used in radar imaging, radio astronomy, etc….

4 Background http://nanoall.blogspot.com/2011/02/nanomembranes.html Mg doped GaN is a p-type semiconductor Mg + Mg concentration is ~10 19 cm -3 GaN density is ~10 22 cm -3 Main Point Study hydrogen interaction in p-type GaN and its alloys.

5 H-H Surface of sample Mg-N H + + GaN Film H 2 ”rich” atmosphere e-e- This hydrogen interaction with Mg+ makes the semiconductor less effective

6 EPR ΔE = g μ B B o Bruker Analytische Messtechnik ESP300 User’s Manual EPR Primer page 2.1 Δ E=h f

7 Experimental Details GaN was grown on sapphire substrate using MOCVD. Concentration of Mg ~4x10 19 cm -3 Al x Ga 1-x N: x ranging from 0.00-0.28 EPR at 4 K : Microwave frequency ~ 9.4 GHz Sapphire substrate AlN AlGaN AlN Al x Ga 1-x N:Mg Sample 2.5 cm1 μm

8 FURNACE DETAILS Isochronal annealing steps ranged from 5 min- 360 min at temperatures ranging from 300 o C to 750 o C in forming gas(7%H 2 :93%N 2 )

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11 Mg signal increases in intensity at low temperature anneals for 0% Al

12 At high Al %, the process of passivating has slowed down.

13 Summary After annealing from 300 o C - 500 o C the Mg signal intensity in 0% Al increases Preliminary data suggest that at 700 o C, high % Al has a slower passivation rate The Mg signal passivates for all samples at 700 o C after being annealed for ~6 h Alloying GaN with aluminum changes the kinematics of hydrogen passivation.


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