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Molecules in Circuits, a New Type of Microelectronics?

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Presentation on theme: "Molecules in Circuits, a New Type of Microelectronics?"— Presentation transcript:

1 Molecules in Circuits, a New Type of Microelectronics?
Richard L. McCreery University of Alberta National Institute for Nanotechnology Edmonton, Alberta, Canada

2 “Organic Electronics”:
Sony organic LED display charge transport by “hopping” across 100 nm – 10 μm distances carriers are radical ions and/or “polarons”, often low stability What happens when charge transfer distance is decreased to 1-25 nm, and electric fields may exceed 106 V/cm ?

3 Our substrate: Pyrolyzed Photoresist Films (PPF)
commercial photoresist (novolac resin) ‘Soft Baking’ 90OC 50 µm Optional Lithography 6000 rpm Clean Si Wafer Spin-Coating Gas Flow 95% N2;5% H2 (1000OC, 1 hour) Pyrolysis “PPF” (roughness < 0.4 nm rms) 50 µm Kim, Song, Kinoshita, Madou, and White, J. Electrochem. Soc., 1998, 145, 2315 Ranganathan, McCreery, Majji, and Madou, J. Electrochem. Soc., , 277–282 Ranganathan, McCreery, Anal. Chem, 2001, 73,

4 e + + • e- . Surface modification via diazonium reduction: CH3CN N2
NH2 HNO2 sp2 carbon R PPF electrode e CH3CN + N2 + R e- surface bond stable to > 500 oC high coverage very low in pinholes prone to multilayer formation. Delamar, M.; Hitmi, R.; Pinson, J.; Saveant, J. M.; J. Am. Chem. Soc. 1992, 114, 5883. Liu, McCreery, J. Am. Chem. Soc., 1995, 117, Belanger, Pinson, Chem. Soc. Reviews 2011, 40, 3995 .

5 V Cu e-carbon Packaged: FIB/TEM: “modified electrode” Ox Red Cu Si
silicon (for contrast) Cu Si 10 nm BTB PPF e-C Au e-carbon “modified electrode” Ox Red 1-6 nm sp2 carbon Adv. Mater , 21, 4304 J. Phys. Chem. C 2010, 114, 15806 J. Am. Chem. Soc. 2011, 133, 19168

6 Pyrolyzed Photoresist Film (PPF) microfabrication:
1. lithography 2. pyrolysis 100 mm PPF structure and conductivity similar to glassy carbon roughness < 0.5 nm rms by AFM

7 Mag. = 10 PPF Echip 4’’ wafer Mag. = 10 Magnification = 1 Junction
molecules attached to PPF by electrochemical reduction of diazonium ions PPF leads Junction Mag. = 10 PPF Echip 4’’ wafer Cu/Au deposited through shadow mask Mag. = 10 next slide Magnification = 1

8 Mag. = 60 TEM 1 µm FIB/TEM: Mag. = 5,000,000 cleave through
junction region, then SEM of “edge” Mag. = 60 Cu Au sp2 carbon 5 nm silicon (for contrast) FIB/TEM: Mag. = 5,000,000 TEM SiO2 Si PPF Cu/Au 1 µm junction region Mag. = 30,000 Cu/Au SiO2 PPF Molecules (not resolved) 100 nm Mag. = 300,000

9 near Jasper, Alberta

10 no molecule 32 junctions 1 mA NAB 0.5 V NAB V log scale looks like
-2 -1 1 2 -1.0 -0.5 0.0 0.5 1.0 J(A/cm ) 80 x 80 μm junction 32 junctions NAB N O NAB (nitroazobenzene) log scale exponential above ~0.2 V V frequency independent, 0.01 to 105 Hz symmetric can scan > 109 cycles without change survived 150 oC for > 40 hrs looks like Marcus kinetics Is it? ACS Applied Materials & Interfaces 2010, 2, 3693

11 not activated for T<200 K
Arrhenius: 37 meV 0.03 meV T = 5 K d = 2.2 nm 2.8 nm 3.3 nm 4.5 nm 5.2 nm molecular layer thickness not activated for T<200 K strong thickness dependence NOT activated electron transfer, so what is it? J. Phys. Chem C, 2010, 114, 15806

12 ϕelectron ϕhole e¯ d J (A/cm2) = K exp(-βd) Tunneling: Cu sp2 carbon
molecules, insulator, etc vacuum Tunneling: Cu ϕelectron tunneling barriers: EFermi LUMO HOMO sp2 carbon electron density d ϕhole J (A/cm2) = K exp(-βd) -8 -6 -4 -2 2 4 1 3 5 6 d, nm ln J (0.1) vacuum: β ~ 25 nm-1 metal, β ~ 0 NAB: β = 2.5 nm-1 alkane, β = 8.6 nm-1 now, vary HOMO and LUMO energies

13 NO EFFECT! More molecules: 2.4 eV range of HOMOs,
2.3 eV range of LUMOs NH S BTB N O also: biphenyl, nitrophenyl, ethynyl benzene, anthraquinone (9 molecules, >400 junctions) NO EFFECT! β = 8.7 nm-1 Sayed, Fereiro, Yan, McCreery, Bergren; PNAS (2012) 109,

14 Energy levels of PPF/molecule from
vacuum Energy levels of PPF/molecule from Ultraviolet Photoelectron Spectroscopy: e‾ EF - EHOMO e‾ WF PPF NO2 Br C CH hv=21.2 eV WF=4.40 4.53 4.88 4.97 EFermi * method of Kim, Choi, Zhu, Frisbie, JACS 2011, 133, 19864 * mean for 8 aromatics= 1.3 ± 0.2 eV aliphatic= 2.0 ± 0.1 eV

15 UPS and Simmons barriers are consistent, and correlate
-2 Free molecule HOMOs: Molecules bonded to PPF: -3 PPF -4 NC8H17 2.0 ± 0.1 eV 1.3 ± 0.2 eV (aromatics) Energy (eV vs. Vacuum) 0.69 -5 BTB -6 AB PhBr 2.99 -7 NAB NP UPS and Simmons barriers are consistent, and correlate with observed β values -8 NC8H17 Sayed, Fereiro, Yan, RLM, Bergren, PNAS, 109, (2012)

16 Why? “leveling” effect of strong coupling
need to consider the system, not just isolated components S WF ~ 4.4+ eV 4.6 eV+ 1.2 eV WF ~ 4.6+ eV PPF (unmodified) HOMO ~5.3* S Free molecules: HOMO ~6.6* 2.0 N O 0.7 eV N O WF ~ 5.1+ eV 4.6 eV electron donating 1.3 eV electron withdrawing * B3LYP 6-31G(d) + experimental

17 HOMO-1 orbital* Strong coupling: “graphene” electrode 0o dihedral
“molecule” 0o dihedral 20o dihedral 60o dihedral 37o dihedral dihedral angle between G9 and NAB Cu Substituents on molecule affect both HOMO and Fermi levels in “strong coupling” limit Where does the electrode stop and the molecule begin? *Gaussian ‘03, B3LYP/6-31G(d)

18 whatever we can do with tunnel junctions
Something special about molecular tunnel junctions: 5 nm +1 V 0 V molecules electron transit time ≈ 15 fsec (15 x seconds) maximum frequency > 10,000 GHz whatever we can do with tunnel junctions should be VERY fast

19 a problem with tunneling: J (A/cm2) = K exp(-βd) β = 0.03 nm-1 (??)
0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1 2 3 4 5 distance, nm 9 0.03 probability a problem with tunneling: J (A/cm2) = K exp(-βd) β = 0.03 nm-1 (??) β = 9 nm-1 (alkane) β = 3 nm-1 (aromatic) β = 1 nm-1 (??) we need to seriously reduce β if molecular electronics is to be broadly practical so far, we are really doing “barrier” electronics

20 ϕe ϕh BTB Efermi d what happens beyond tunnelling? metallic contacts
(electron tunnelling barrier) ϕh (hole β = 8.7 nm-1 d what happens beyond tunnelling?

21 V BTB (bis-thienyl benzene) in “all-carbon” junction Au
metallic contacts -4.8 -5.3 -1.5 eV Energy vs. vacuum, eV 4.5 – 22 nm multilayer PPF (sp2 carbon) Au e-beam carbon V S collaboration with: Maria Luisa Della Rocca, Pascal Martin, Philippe Lafarge, Jean-Christophe Lacroix, University of Paris

22 activated “hopping” by redox
thickness, nm: 4.5 5.0 8.0 13 16 22 tunnelling? unlikely across 22 nm 300 K 4.5 5.0 8.0 10.5 13 22 7.0 16 300 K note curvature, not simple exponential conventional wisdom: activated “hopping” by redox exchange for d > 5-10 nm

23 300 K <10 K weakly activated, if at all,
8.0 10.5 4.5 nm 22 300 K 4.5 nm 8.0 10.5 22 <10 K weakly activated, if at all, not consistent with redox exchange

24 What about β, the attenuation coefficient ?
300 K β = 3.0 ± 0.3 nm-1 (N=8) coherent tunnelling for d< 8 nm 10 6K 100K 200K 250K 300K so what is this? not activated, β~ 1 nm-1 5 β = 1.0 ± 0.2 nm-1 (N=19) activated hopping, d> 15 nm, T>200 K ln J (1V) -5 β = 0.1 ± 0.1 nm-1 (N=6) at 300K Arrhenius slope= 160 meV (>200 K) 0.3 meV (5-50 K) (bulk polythiophene: 130 – 280 meV) -10 -15 -20 5 10 15 20 25 d , nm Haijun Yan, et al. PNAS, 110, 5326 (2013)

25 the usual suspects: characteristic plot:
Fowler Nordheim (field emission) linear lnJ vs 1/E (E= electric field) variable range hopping linear lnJ vs T-1/2 or T-1/4 Schottky emission (i.e. thermionic) linear lnJ vs 1/T redox hopping linear ln J vs 1/T space charge limited conduction linear J vs V2 Poole-Frenkel transport between “traps” linear ln (J/E) vs E1/2 (note: controlled by electric field, not thickness. certainly NOT tunneling) R2 = 300 K 4.5 nm 8.0 10.5 22 < 10K 4.5 nm 22 10.5 8.0

26 ( ) Poole-Frenkel transport between “coulombic traps”: V < 0 e-
trap depth decreases with increasing electric field Arrhenius slope (ln J vs 1/T) = ϕtrap E1/2 q πε ( ) 1/2 note: a field-dependent “activation” barrier

27 ( ) trap q ϕtrap - E1/2 πε E1/2 (V/cm)1/2
Arrhenius slope (ln J vs 1/T) = ϕtrap E1/2 q πε ( ) 1/2 trap 350 16 nm 300 250 200 22 nm 10.5 nm 150 200 - 300K Arrhenius slope, meV 100 50 500 1000 1500 2000 activation barrier → 0 at high field E1/2 (V/cm)1/2 E 1/2

28 molecular orbital (e.g. HOMO):
Suppose the “trap” is actually an occupied molecular orbital (e.g. HOMO): BTB subunits, connected but not polarons ~0.35 V “trap” (i.e. HOMO) V=0 + V<0 - “Molecular field ionization” Note: field ionization in gas phase occurs at ~107 V/cm; our field is ~106 V/cm, but “trap” is much shallower A bit like “dry electro- chemistry”, but without a double layer and not “activated”

29 “There's Plenty of Room at the Bottom”
Richard Feynman, 1959 “There's Plenty of Room at the Bottom” β = 8.7 nm-1 “the bottom” for aromatic molecular junctions ? β = 2.7 nm-1 “barrier electronics” and not much control over barrier height

30 There is plenty of room in the middle !!
bulk semi- conductors hopping, redox exchange tunnel junctions transport distance, nm 10 20 30 40 100+ nm coherent tunnelling conjugation length scattering length ?? resonant transport field ionization ?? (low mobility, reactive species) There is plenty of room in the middle !! Phys. Chem. Chem. Phys., 2013,15, 1065

31 ϕe ϕh BTB A preview of some new molecules: β≈ 3 nm-1
metallic contacts Efermi ϕe ϕh A preview of some new molecules: β≈ 3 nm-1 β≈ 0.3 nm-1, Eact < 30 meV -10 -5 β≈ 0.12 nm-1, Eact < 50 meV NAB, AB, etc factor of >106 β≈ 1 nm-1 β≈ 0, but thermal BTB -15 -20 10 20 30 d, nm


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